Zobrazeno 1 - 10
of 17
pro vyhledávání: '"Nikhil Reddy Mucha"'
Publikováno v:
AIP Advances, Vol 11, Iss 4, Pp 045204-045204-8 (2021)
Titanium nitride thin films have been grown on c-plane sapphire substrates using a pulsed laser deposition technique in the thickness range of 6–45 nm. X-ray diffraction (XRD) analysis has demonstrated TiN (111) as the preferred orientation of grow
Externí odkaz:
https://doaj.org/article/5da5e2e3e558462995b6e7ffb020c8ba
Autor:
Ram K. Gupta, Jonghyun Choi, Nikhil Reddy Mucha, Surabhi Shaji, Jacob Som, Dhananjay Kumar, Amy M. Elliott, Corson L. Cramer, Harry M. Meyer
Publikováno v:
ACS Applied Energy Materials. 3:8366-8374
TiNxOy (TiNO) thin films with superior electrochemical properties have been synthesized in situ using a pulsed laser deposition method and a varied oxygen partial pressure from 5 to 25 mTorr. The e...
Autor:
Dhananjay Kumar, Svitlana Fialkova, Mark R. Anderson, P. R. Apte, Nikhil Reddy Mucha, Jeffrey E. Shield, Balamurugan Balasubramanian, Jacob Som, Surabhi Shaji
Publikováno v:
Journal of Materials Science. 55:5123-5134
A TiNxOy (TiNO) material system has been synthesized in thin film form for the first time using a pulsed laser deposition process. X-ray diffraction and X-ray photoelectron spectroscopy measurements have been carried out to show partial oxidation of
Autor:
Manosi Roy, Rahul Ponnam, Panupong Jaipan, Sergey Yarmolenko, Nikhil Reddy Mucha, Dhananjay Kumar, Onome Scott-Emuakpor, A. K. Majumdar
Publikováno v:
Thin Solid Films. 681:1-5
Detailed electrical resistivity (ρ) measurements have been carried out in epitaxial TiN thin films in the temperature (T) range of 4 ≤ T ≤ 300 K in magnetic fields from 0 to 6 T. The ρ (T) data show distinct minima around 38 K, which remains un
Autor:
Jacob Som, Jonghyun Choi, Honglin Zhang, Nikhil Reddy Mucha, Svitlana Fialkova, Kwadwo Mensah-Darkwa, Jin Suntivich, Ram K. Gupta, Dhananjay Kumar
Publikováno v:
Materials Science and Engineering: B. 280:115711
Autor:
Panupong Jaipan, Nikhil Reddy Mucha, Sergey Yarmolenko, Duy Tran, Kaushik Sarkar, Jonghyun Choi, Onome Scott-Emuakpor, Talisha M. Haywood, Ram K. Gupta, Mannur J. Sundaresan, Dhananjay Kumar
Publikováno v:
SN Applied Sciences. 2
Titanium nitride (TiN) thin films are deposited on titanium (Ti) substrates by pulsed laser deposition and radio frequency magnetron sputtering. The main goal of this research is to improve the corrosion resistance and the vibration damping performan
Autor:
Adele Moatti, Chandra Shekar Reddy Nannuri, Onome Scott-Emuakpor, Jay Narayan, Christian Binek, Nikhil Reddy Mucha, Zhigang Xu, Dhananjay Kumar, Svitlana Fialkova, Sergey Yarmolenko, Abebe Kebede, Ruben Kotoka, Mayur P. Singh, Panupong Jaipan
Publikováno v:
Materials Focus. 7:720-725
Publikováno v:
Data in Brief, Vol 27, Iss, Pp-(2019)
Data in Brief
Data in Brief
Iron-tantalum (Fe–Ta) thin films were synthesized on silicon (Si) (100) substrates using a pulsed laser deposition (PLD) technique. For the analysis of all reported data, please refer to our main article “Magnetic and electrical properties of Fe9
Publikováno v:
Materials & Design, Vol 134, Iss, Pp 218-225 (2017)
Low thermal conductivity carbon is a type of material for special uses such as thermal insulation/protection and particularly for ablative thermal protection material of reentry vehicles and rocket engine components. In this research, a low thermal c
Publikováno v:
AIP Advances, Vol 11, Iss 4, Pp 045204-045204-8 (2021)
Titanium nitride thin films have been grown on c-plane sapphire substrates using a pulsed laser deposition technique in the thickness range of 6–45 nm. X-ray diffraction (XRD) analysis has demonstrated TiN (111) as the preferred orientation of grow