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pro vyhledávání: '"Nijing Pi"'
Autor:
Dong Chunhui, Mengjie He, He Maodong, Chang Xin, Cao Xiaokang, Feng Tao, Rui Shouzhen, Liu Ziyang, Nijing Pi
Publikováno v:
2021 IEEE 12th International Conference on Mechanical and Intelligent Manufacturing Technologies (ICMIMT).
Temperature fast change during a step or several steps is required by latest etching process in IC manufacturing. Two methods to reach this requirement was described, and several simulation devices are designed to test the capability. The temperature
Publikováno v:
2021 IEEE Asia-Pacific Conference on Image Processing, Electronics and Computers (IPEC).
In semiconductor integrated circuit manufacturing, lithography, etching, physical vapor deposition, chemical vapor deposition and other processes, which need to use chiller for precise temperature control of process chamber. The special chiller for s