Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Niels Geypen"'
Autor:
Christina L. Porter, Teis Coenen, Niels Geypen, Sandy Scholz, Loes van Rijswijk, Han-Kwang Nienhuys, Jeroen Ploegmakers, Johan Reinink, Hugo Cramer, Rik van Laarhoven, David O'Dwyer, Peter Smorenburg, Andrea Invernizzi, Ricarda Wohrwag, Hugo Jonquiere, Juliane Reinhardt, Omar El Gawhary, Simon G. J. Mathijssen, Peter D. Engblom, Heidi Chin, William T. Blanton, Sury Ganesan, Brian J. Krist, Florian Gstrein, Mark Phillips
Publikováno v:
Metrology, Inspection, and Process Control XXXVII.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b27f24e445e7420276b78ecc827d09a6
https://doi.org/10.1117/12.2658495
https://doi.org/10.1117/12.2658495
Autor:
Laurens de Winter, Shaunee Cheng, Augustus J. E. M. Janssen, Paul van Adrichem, Wim M. J. Coene, Niels Geypen, Sven van Haver, Koen D'havé
Publikováno v:
Applied Optics, 53(12), 2562-2582. Optical Society of America (OSA)
In this paper, a new methodology is presented to derive the aberration state of a lithographic projection system from wafer metrology data. For this purpose, new types of phase-shift gratings (PSGs) are introduced, with special features that give ris
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::12fce26f509ae483d685a6355a579280
https://doi.org/10.1364/ao.53.002562
https://doi.org/10.1364/ao.53.002562