Top-coats for scalable nano-manufacturing with high-χ block copolymers in lithographic applications

Autor: Chevalier, Xavier, Gomes correia, Cindy, POUND-LANA, Gwenaelle, Bézard, Philippe, SÉRÉGÉ, Matthieu, PETIT-ETIENNE, Camille, Gay, Guillaume, Cunge, Gilles, CABANNES-BOUÉ, Benjamin, Nicolet, Célia, Navarro, Christophe, Cayrefourcq, Ian, Müller, Marcus, Hadziioannou, Georges, Iliopoulos, Ilias, Fleury, Guillaume, Gomez Correia, Cindy, Zelsmann, M.

Publikováno v: Advances in Patterning Materials and Processes XXXVIII
Advances in Patterning Materials and Processes XXXVIII, Feb 2021, Online Only, France. pp.26, ⟨10.1117/12.2583717⟩
Proc. SPIE 11612, Advances in Patterning Materials and Processes XXXVIII
SPIE Advanced Lithography conference – Alternative Lithographic Technologies
SPIE Advanced Lithography conference – Alternative Lithographic Technologies, Feb 2021, San Jose, USA, France. pp.26, ⟨10.1117/12.2583717⟩

Results for the self-assembly of lamellar silicon-containing high-χ block copolymers (BCP) with innovative neutral top-coat design are presented. We demonstrate that these materials and associated processes are compatible with a standard lithographi

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::eadbf2006f9b9cd3348720c9fd567c1c
https://hal.univ-grenoble-alpes.fr/hal-03448358

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Graphoepitaxy integration and pattern transfer of lamellar silicon-containing high-chi block copolymers

Autor: Zelsmann, Marc, Bézard, Philippe, Chevalier, Xavier, Legrain, Antoine, Navarro, Christophe, Nicolet, Célia, Fleury, Guillaume, Cayrefourcq, Ian, Tiron, Raluca, Engelmann, Sebastian, Wise, Richard

Publikováno v: Proc. SPIE
SPIE Advanced Lithography
SPIE Advanced Lithography, 2018, San José, United States. ⟨10.1117/12.2299337⟩

In this work, we present our recent achievements on the integration and transfer etching of a novel silicon-containing high-χ block copolymer for lines/spaces applications. Developed carbo-silane BCPs are synthesized under industrial conditions and

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::84ede20949bda1d236cf2b1f0c2029a4
https://hal.univ-grenoble-alpes.fr/hal-01954390

Evaluation of adhesion layers performances for soft UV nanoimprint lithography.

Autor: Delachat, F., Teyssedre, H., Pain, L., Chevalier, X, Nicolet, Célia, Navarro, Christophe

Publikováno v: Proceedings of SPIE; 1/21/2019, Vol. 10958, p1-7, 7p

Top-coats for scalable nano-manufacturing with high-χ block copolymers in lithographic applications

Autor: Sanders, Daniel P., Guerrero, Douglas, Chevalier, Xavier, Gomes Correia, Cindy, Pound-Lana, Gwenaelle, Bézard, Philippe, Sérégé, Matthieu, Petit-Etienne, Camille, Gay, Guillaume, Cunge, Gilles, Cabannes-Boué, Benjamin, Nicolet, Célia, Navarro, Christophe, Cayrefourcq, Ian, Müller, Marcus, Hadziioannou, Georges, Iliopoulos, Ilias, Fleury, Guillaume, Zelsmann, Marc

Publikováno v: Proceedings of SPIE; February 2021, Vol. 11612 Issue: 1 p116120O-116120O-8, 1045089p