Effects of the substrate temperature on the deposition of thin SiOx films by atmospheric pressure microwave plasma torch (TIA)

Autor: Christophe Le Niniven, Christelle Dublanche-Tixier, Pascal Tristant, Nicolas Lory, Cédric Jaoul, Xavier Landreau

Publikováno v: Surface and Coatings Technology
Surface and Coatings Technology, Elsevier, 2011, 205, pp.S335-S341. ⟨10.1016/j.surfcoat.2011.03.123⟩

The effect of surface temperature on the deposition of silicon oxide (SiO x ) films with a non-thermal microwave axial injection torch (TIA) was investigated in an open air reactor. Argon was used as plasma gas and hexamethyldisiloxane (Si 2 O 2 C 6

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a10aec8dae295f5b57a98ed5ca8cb2f9
https://hal.archives-ouvertes.fr/hal-00611718