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pro vyhledávání: '"Niclas Mika"'
Autor:
Uwe Stamm, Jo Finders, Jan van Schoot, Jos Benschop, Eelco van Setten, Judon Stoeldraijer, Sascha Migura, Winfried Kaiser, Bernd Thuering, Niclas Mika, Peter Krabbendam, Bernhard Kneer, Tilmann Heil, Kars Zeger Troost, Rob van Ballegoij, Erik Roelof Loopstra, Jeannot Dredonx, Hans Meiling, Alberto Pirati
Publikováno v:
Extreme Ultraviolet (EUV) Lithography VIII
While EUV systems equipped with a 0.33 Numerical Aperture lenses are readying to start volume manufacturing, ASML and Zeiss are ramping up their development activities on a EUV exposure tool with Numerical Aperture greater than 0.5. The purpose of th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::68a7dec32f2aad60f2519b66c46f6ca0
