Zobrazeno 1 - 10
of 14
pro vyhledávání: '"Nick F. W. Thissen"'
Autor:
Hannah Johnson, Nick F. W. Thissen, Stacey F. Bent, Wilhelmus M. M. Kessels, Ageeth A. Bol, Adriaan J. M. Mackus, Woo-Hee Kim, Joseph A. Singh
Publikováno v:
Chemistry of Materials
Chemistry of Materials, 30(3). American Chemical Society
Chemistry of Materials, 30(3). American Chemical Society
Area-selective atomic layer deposition (ALD) is envisioned to play a key role in next-generation semiconductor processing and can also provide new opportunities in the field of catalysis. In this work, we developed an approach for the area-selective
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::13a190a45fe6ae1540d3642a8de772f9
https://doi.org/10.1021/acs.chemmater.7b03818
https://doi.org/10.1021/acs.chemmater.7b03818
Autor:
RG Robert Houben, Marcel A. Verheijen, Ageeth A. Bol, van der G Marel, Wmm Erwin Kessels, Nick F. W. Thissen
Publikováno v:
Carbon, 121, 389-398. Elsevier
We have investigated the synthesis of single-walled carbon nanotubes (SWCNTs) employing Co3O4 films prepared by atomic layer deposition (ALD). These films dewet into Co catalyst nanoparticles in the furnace before starting CNT growth by chemical vapo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5e45efed2c86f6b6128ae191772bd1f9
https://doi.org/10.1016/j.carbon.2017.06.001
https://doi.org/10.1016/j.carbon.2017.06.001
Autor:
Adriaan J. M. Mackus, Nick F. W. Thissen, Zhihong Chen, Petrus Hubertus Franciscus Trompenaars, Johannes Jacobus Lambertus Mulders, Wilhelmus M. M. Kessels, Ageeth A. Bol
Publikováno v:
Applied Physics Letters, 110(1):013101, 1-5. American Institute of Physics
Carbon nanotubes are considered as alternative channel material for future transistors, but several challenges exist for reliable fabrication of these devices. In this work, carbon nanotube field-effect transistors (CNTFETs) were fabricated by patter
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d8a2dcd930a9733654415fcb1d37b6ce
https://doi.org/10.1063/1.4973359
https://doi.org/10.1063/1.4973359
Autor:
Adriaan J. M. Mackus, Ageeth A. Bol, Diana Garcia-Alonso, René H. J. Vervuurt, Marcel A. Verheijen, Wilhelmus M. M. Kessels, Nick F. W. Thissen, Simone Assali, Matthieu Weber
Publikováno v:
Nanotechnology, 27(3):034001, 1-13. Institute of Physics
The deposition of Pd and Pt nanoparticles by atomic layer deposition (ALD) has been studied extensively in recent years for the synthesis of nanoparticles for catalysis. For these applications, it is essential to synthesize nanoparticles with well-de
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::42c776aedf70d5384672add19f7ec4d9
https://research.tue.nl/en/publications/c8a9179f-0c0f-45e0-8456-be9366e7d15a
https://research.tue.nl/en/publications/c8a9179f-0c0f-45e0-8456-be9366e7d15a
Autor:
Yuqing Jiao, Bora Karasulu, JW Jan-Willem Weber, Nick F. W. Thissen, Ageeth A. Bol, Wilhelmus M. M. Kessels, René H. J. Vervuurt
Publikováno v:
Advanced Materials Interfaces, 5(13):1800268. Wiley
Pt-graphene contacts are fabricated by atomic layer deposition (ALD) on H2 and O2 plasma functionalized graphene. The plasma functionalization of graphene enables the growth of uniform Pt layers on graphene by ALD and improves the Pt-graphene interac
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::95ba7cbbbe2714e875653379ac8e6ed7
https://research.tue.nl/nl/publications/fdd80310-7a6f-4158-83dc-095063ddb54d
https://research.tue.nl/nl/publications/fdd80310-7a6f-4158-83dc-095063ddb54d
Publikováno v:
physica status solidi (RRL) - Rapid Research Letters. 9:393-396
The preparation of high-quality molybdenum oxide (MoOx) is demonstrated by plasma-enhanced atomic layer deposition (ALD) at substrate temperatures down to 50 °C. The films are amorphous, slightly substoichiometric with respect to MoO3, and free of o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c63729f9bada6977d82cd4fb89701dc5
https://doi.org/10.1002/pssr.201510117
https://doi.org/10.1002/pssr.201510117
Autor:
Nick F. W. Thissen, Zhihong Chen, Lian-Mao Peng, Aggeth Bol, H.S. Phillip Wong, Gage Hills, Subhasish Mitra
Publikováno v:
MRS Bulletin, 39, 719-726. Materials Research Society
Single-wall carbon nanotubes (CNTs) were discovered in 1993 and have been an area of intense research since then. They offer the right dimensions to explore material science and physical chemistry at the nanoscale and are the perfect system to study
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f7b0b1ae68dd9a93d83357f8b51ec8f3
https://doi.org/10.1557/mrs.2014.164
https://doi.org/10.1557/mrs.2014.164
Autor:
Rhj René Vervuurt, Nick F. W. Thissen, Jjl Hans Mulders, JW Jan-Willem Weber, Ageeth A. Bol, Wmm Erwin Kessels
Publikováno v:
Applied Physics Letters, 107:2131101. American Institute of Physics
The patterning of graphene by a 30 kV Ga+ focused ion beam (FIB) is studied by in-situ and ex-situ Raman spectroscopy. It is found that the graphene surrounding the patterned target area can be damaged at remarkably large distances of more than 10 μ
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::28664b91053b09190850904acd9287c8
https://doi.org/10.1063/1.4936334
https://doi.org/10.1063/1.4936334
Publikováno v:
Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films, 32(1):01A108. AVS Science and Technology Society
Atomic layer deposition (ALD) is an ideal technique to deposit ultrathin, conformal, and continuous metal thin films. However, compared to the ALD of binary materials such as metal oxides and metal nitrides, the surface reaction mechanisms during met
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::68a69b4de592533d044f7a980cdb891c
http://www.scopus.com/inward/record.url?scp=84891759479&partnerID=8YFLogxK
http://www.scopus.com/inward/record.url?scp=84891759479&partnerID=8YFLogxK
Autor:
Ageeth A. Bol, Phf Trompenaars, Ajm Adrie Mackus, Jjl Hans Mulders, Marcel A. Verheijen, Nick F. W. Thissen, Wmm Erwin Kessels
Publikováno v:
Journal of Physical Chemistry C, 117(20), 10788-10798. American Chemical Society
Electron beam-induced deposition (EBID) enables the direct-write patterning of metallic structures with sub-10 nm lateral resolution without the use of resist films or etching/lift-off steps but generally leads to material of poor quality and suffers
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::339de1d02ab3464e15efc77d246dbcfe
https://research.tue.nl/nl/publications/43d14a9f-6090-40c8-b30a-58a6e4696373
https://research.tue.nl/nl/publications/43d14a9f-6090-40c8-b30a-58a6e4696373