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pro vyhledávání: '"Nick A. Stacey"'
Autor:
Eui Kyoon Kim, C. Grant Willson, Michael D. Dickey, S. Johnson, Nick A. Stacey, Ryan L. Burns
Publikováno v:
AIChE Journal. 51:2547-2555
Step and Flash Imprint Lithography (SFIL) is a promising high-resolution, yet low-cost patterning technique that uses a UV induced photopolymerization to replicate features on a patterned template. The SFIL process utilizes an acrylate-based free rad
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4b247a487496140b51248099df51415e
https://doi.org/10.1002/aic.10477
https://doi.org/10.1002/aic.10477
