Zobrazeno 1 - 10
of 12
pro vyhledávání: '"Nicholas W. Jenkins"'
Autor:
Yuka Esashi, Nicholas W. Jenkins, Michael Tanksalvala, Yunzhe Shao, Brendan McBennett, Joshua L. Knobloch, Henry C. Kapteyn, Margaret M. Murnane
Publikováno v:
Metrology, Inspection, and Process Control XXXVII.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c1b3907efca6b81b6454d7bf71471f18
https://doi.org/10.1117/12.2658543
https://doi.org/10.1117/12.2658543
Autor:
Nathan J. Brooks, Bin Wang, Iona Binnie, Michael Tanksalvala, Yuka Esashi, Joshua L. Knobloch, Quynh L. D. Nguyen, Brendan McBennett, Nicholas W. Jenkins, Guan Gui, Zhe Zhang, Henry C. Kapteyn, Margaret M. Murnane, Charles S. Bevis
Publikováno v:
Optics express. 30(17)
We demonstrate temporally multiplexed multibeam ptychography implemented for the first time in the EUV, by using a high harmonic based light source. This allows for simultaneous imaging of different sample areas, or of the same area at different time
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a1d198481d99abba56632fd843a91829
https://pubmed.ncbi.nlm.nih.gov/36242139
https://pubmed.ncbi.nlm.nih.gov/36242139
Autor:
Matthew N. Jacobs, Yuka Esashi, Nicholas W. Jenkins, Nathan J. Brooks, Henry C. Kapteyn, Margaret M. Murnane, Michael Tanksalvala
Publikováno v:
Optics express. 30(15)
Recent advances in structured illumination are enabling a wide range of applications from imaging to metrology, which can benefit from advanced beam characterization techniques. Solving uniquely for the spatial distribution of polarization in a beam
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a003e7591d8003b5df753141fbc045d7
https://pubmed.ncbi.nlm.nih.gov/36236954
https://pubmed.ncbi.nlm.nih.gov/36236954
Autor:
Chen-Ting Liao, Henry C. Kapteyn, Margaret M. Murnane, Yuka Esashi, Michael Tanksalvala, Bin Wang, Nicholas W. Jenkins, Zhe Zhang
Publikováno v:
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
Coherent Fourier scatterometry (CFS) via laser beams with a Gaussian spatial profile is routinely used as an in-line inspection tool to detect defects on, for example, lithographic substrates, masks, reticles, and wafers. New metrology techniques tha
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f589b0794eeae518f6c23bfd0688f0f9
https://doi.org/10.1117/12.2584728
https://doi.org/10.1117/12.2584728
Autor:
Bin Wang, Michael Tanksalvala, Zhe Zhang, Yuka Esashi, Nicholas W. Jenkins, Margaret Murnane, Henry Kapteyn, Chen-Ting Liao
Publikováno v:
Frontiers in Optics + Laser Science 2021.
Coherent Fourier scatterometry (CFS) using laser beams with a Gaussian spatial profile is routinely used as an in-line inspection tool in semiconductor industry. Here, a set of novel defect inspection techniques are proposed and investigated numerica
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1b55a9c4daf5b48b04bd28719b6afa50
https://doi.org/10.1364/fio.2021.jth5a.127
https://doi.org/10.1364/fio.2021.jth5a.127
Autor:
Michael Tanksalvala, Chen-Ting Liao, Charles Bevis, Peter Johnsen, Yuka Esashi, Margaret M. Murnane, Nicholas W. Jenkins, Henry C. Kapteyn, Matthew N. Jacobs, Michael Gerrity, Zhe Zhang
Publikováno v:
OSA Imaging and Applied Optics Congress 2021 (3D, COSI, DH, ISA, pcAOP).
An analysis of blind ptychography that provides predictions of error and the reconstructed field-of-view (FOV) is presented. The utility of this analysis is demonstrated with a new approach called dual-grid ptychography that maximizes the FOV.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5322b05dd61b7737f9b460508f4cc29b
https://doi.org/10.1364/cosi.2021.cw6b.1
https://doi.org/10.1364/cosi.2021.cw6b.1
Autor:
Daniel E. Adams, Henry C. Kapteyn, Matthew N. Jacobs, Peter Johnsen, Jihan Zhou, Chen-Ting Liao, Naoto Horiguchi, Nicholas W. Jenkins, Michael Tanksalvala, Seth L. Cousin, David Ren, Zhe Zhang, Laura Waller, Bin Wang, Margaret M. Murnane, Jianwei Miao, Michael Gerrity, Galen P. Miley, Christina L. Porter, Sadegh Yazdi, Yuka Esashi, Brendan McBennett, Robert Karl, Charles Bevis, Joshua Knobloch
Publikováno v:
Science Advances
A new imaging technique enables nondestructive, 3D characterization of nanostructures, their composition, and interfaces.
Next-generation nano- and quantum devices have increasingly complex 3D structure. As the dimensions of these devices shrink
Next-generation nano- and quantum devices have increasingly complex 3D structure. As the dimensions of these devices shrink
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::47fb75cdb2efd2a52b1d9ce64a249efe
https://pubmed.ncbi.nlm.nih.gov/33571123
https://pubmed.ncbi.nlm.nih.gov/33571123
Autor:
Michael Gerrity, Yuka Esashi, Henry C. Kapteyn, Margaret M. Murnane, Matthew N. Jacobs, Nicholas W. Jenkins, Bin Wang, Christina L. Porter, Naoto Horiguchi, Michael Tanksalvala
Publikováno v:
OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS).
We present a versatile, ptychographic phase-sensitive imaging EUV reflectometer that can nondestructively image samples with spatial, depth and compositional resolution, with sensitivities to dopant levels and interface quality.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::962abafcd5b4feeed4508803104ef3b4
https://doi.org/10.1364/euvxray.2020.ew3a.4
https://doi.org/10.1364/euvxray.2020.ew3a.4
Autor:
Peter Johnsen, Bin Wang, Yuka Esashi, Xiaoshi Zhang, Robert Karl, Charles Bevis, Nicholas W. Jenkins, Christina L. Porter, Michael Gerrity, Daniel E. Adams, Galen P. Miley, Naoto Horiguchi, Michael Tanksalvala, Seth L. Cousin, Henry C. Kapteyn, Margaret M. Murnane
Publikováno v:
Imaging and Applied Optics 2019 (COSI, IS, MATH, pcAOP).
We present a tabletop-scale complex-imaging EUV reflectometer that uses grazing- incidence ptychographic imaging to non-destructively determine depth-dependent, spatially-resolved composition with high sensitivity to chemical makeup, thin film layer
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b1ef67f6bcffe1f6d1a2d7d6ed17d012
https://doi.org/10.1364/cosi.2019.cw3a.6
https://doi.org/10.1364/cosi.2019.cw3a.6
Autor:
Henry C. Kapteyn, Zhe Zhang, Yuka Esashi, Michael Tanksalvala, Nicholas W. Jenkins, Margaret M. Murnane
Publikováno v:
OSA Continuum. 4:1497
The influence of surface and interface roughness on X-ray and extreme ultraviolet (EUV) reflectometry is becoming increasingly important as layer thicknesses decrease to a few nanometers in next-generation nanodevices and multilayer optics. Here we s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::49f98e9256aaa0a14d5f890d933254bf
https://doi.org/10.1364/osac.422924
https://doi.org/10.1364/osac.422924