Zobrazeno 1 - 10
of 13
pro vyhledávání: '"Nicholas A. Stacey"'
Autor:
Nicholas M Stacey, Martin Feddersen
Publikováno v:
The Medical journal of Australia. 217(4)
Autor:
Emma R. Parmee, Simon V. Mortlock, Nicholas A. Stacey, Eric J. Thomas, (the late) Owen S. Mills
Publikováno v:
Journal of the Chemical Society, Perkin Transactions 1. :381-390
Dehydration of the 5-hydroxycyclohexanecarboxylate 13 gives the exocyclic alkene 14 rather than its endocyclic isomer. However, the 3,4-double bond can be introduced into precursors of milbemycin E 1 using oxidative elimination of phenylselanyl keton
Publikováno v:
J. Chem. Soc., Perkin Trans. 1. :1507-1519
The 6-chloro-4,6-dideoxygalactoside 8 was prepared by selective dichlorination of methyl α-D-glucopyranoside 6 followed by hydrogenolysis, and was converted into the epoxyalkyldithioacetal 10 by treatment with propane- 1,3-dithiol, protection, and f
Autor:
C. Grant Willson, Jin Choi, Daniel A. Babbs, Van N. Truskett, Sidlgata V. Sreenivasan, Frank Y. Xu, Michael Watts, Ecron Thompson, Ian M. Mcmackin, Norman E. Schumaker, Nicholas A. Stacey, Philip D. Schumaker
Publikováno v:
SPIE Proceedings.
The Step and Flash Imprint Lithography (S-FILTM) process is a step and repeat nano-replication technique based on UV curable low viscosity liquids. Molecular Imprints, Inc. (MII) develops commercial tools that practice the S-FIL process. This talk wi
Autor:
William J. Dauksher, Kevin J. Nordquist, Sean D. Burns, C. Grant Willson, Yi Wei, Kathleen A. Gehoski, Ryan L. Burns, Douglas J. Resnick, David P. Mancini, Nicholas A. Stacey, Eui K. Kim, Diana Convey, Gerard M. Schmid, Jason E. Meiring, Michael D. Dickey, Stephen C. Johnson, Peter Fejes
Publikováno v:
SPIE Proceedings.
Step and Flash Imprint Lithography (SFIL) is a revolutionary next generation lithography option that has become increasingly attractive in recent years. Elimination of the costly optics of current step and scan imaging tools makes SFIL a serious cand
Autor:
William J. Dauksher, John G. Ekerdt, David P. Mancini, Sidlgata V. Sreenivasan, Stephen C. Johnson, Todd Bailey, Norman E. Schumaker, Kevin J. Nordquist, Nicholas A. Stacey, C. Grant Willson, Douglas J. Resnick
Publikováno v:
SPIE Proceedings.
The escalating cost for Next Generation Lithography (NGL) tools is driven in part by the need for complex sources and optics. The cost for a single NGL tool could exceed $50M in the next few years, a prohibitive number for many companies. As a result
Autor:
Douglas J. Resnick, Grant Willson, David P. Mancini, John G. Ekerdt, Chris J. Mackay, Sidlgata V. Sreenivasan, Sanjay K. Banerjee, David Onsongo, Nicholas A. Stacey, Britain J. Smith, William J. Dauksher, Kevin J. Nordquist, J. P. Donnelly, Todd Bailey
Publikováno v:
SPIE Proceedings.
Step and Flash Imprint Lithography (SFIL) is an alternative lithography technique that enables patterning of sub-100 nm features at a cost that has the potential to be substantially lower than either conventional projection lithography or proposed ne
Autor:
Nicholas A.H. Stacey
Publikováno v:
Industrial Management & Data Systems. 82:22-26
The merger brokers' task is to use his skills so as not to allow superficial attitudinising by the negotiating parties to solidify into rigid postures; because if they do, that is the end of the affair and both parties will leave the negotiating tabl
Autor:
Nicholas A.H. Stacey
Publikováno v:
Long Range Planning. 1:13-17
Autor:
Nicholas A.H. Stacey
Publikováno v:
Industrial Management & Data Systems. 80:11-13
THE FUTURE prosperity of the free world's industrial societies is currently in the balance. It is timely therefore that the role of the entrepreneur in industry and the conditions which nurture his development should be the subject of general discuss