Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Never Kaliwoh"'
Publikováno v:
Applied Surface Science. 186:246-250
We report the deposition of thin (Ta2O5)1−x(TiO2)x films on quartz and crystalline p-type Si (1 0 0) by photo-induced CVD using 222 nm excimer lamps at temperatures from 50 to 350 °C. The alkoxide precursors titanium isopropoxide and tantalum tetr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8ee2601511da27c6745f9c5e777a5e1f
https://doi.org/10.1016/s0169-4332(01)00601-8
https://doi.org/10.1016/s0169-4332(01)00601-8
Publikováno v:
Applied Surface Science. 186:241-245
We report the deposition of thin TiO2 films on crystalline Si and quartz by photo-induced chemical vapour deposition (CVD) using UV excimer lamps employing a dielectric barrier discharge in krypton chloride (KrCl∗) to provide intense narrow band ra
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::885189277437fe8133d127ca7bb072ac
https://doi.org/10.1016/s0169-4332(01)00600-6
https://doi.org/10.1016/s0169-4332(01)00600-6
Autor:
Timothy J. Leedham, Eamon O'Connor, Q. Fang, J.-Y. Zhang, Hywel O. Davies, Barry O'Sullivan, Never Kaliwoh, Catherine Dubourdieu, Paul K. Hurley, B. Semmache, Ian W. Boyd, Marc Audier, Anthony C. Jones, J.P. Sénateur, R Howley
Publikováno v:
Le Journal de Physique IV. 11:Pr11-261
An in situ low temperature chemical vapour deposition (CVD) system, featuring surface nitridation, dielectric layer deposition and post deposition anneal is presented. Processing is performed under the influence of ultra-violet radiation. After a ran
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0cd4cf430c3ebdc2c345015372e22558
https://doi.org/10.1051/jp4:20011142
https://doi.org/10.1051/jp4:20011142
Publikováno v:
Applied Surface Science. 168:288-291
We report the low temperature growth of ultrathin SiO2 films on crystalline Si by photo-oxidation with an array of Xe 2 ∗ excimer vacuum ultraviolet (VUV) lamps operating at a wavelength of 172 nm. Ultrathin layers from 1.2 to 3.3 nm thickness were
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f840bbdcc215477f8f1c1994b4e52ae4
https://doi.org/10.1016/s0169-4332(00)00626-7
https://doi.org/10.1016/s0169-4332(00)00626-7
Publikováno v:
Applied Surface Science. 168:13-16
We report the growth of thin films of Ta2O5 doped with TiO2 on Si (1 0 0) substrates at low temperatures by a new photo-induced sol–gel process. Polymeric sols were formed through hydrolysis and condensation of tantalum ethoxide mixed with titanium
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e6f8580968fd0fbb6641c6bf2f1db377
https://doi.org/10.1016/s0169-4332(00)00565-1
https://doi.org/10.1016/s0169-4332(00)00565-1
Publikováno v:
Surface and Coatings Technology. 125:424-427
We report the growth of single- and multilayer films of titanium dioxide (TiO2) on Si(100) substrates at low temperature by a new photo-induced sol–gel process. Polymeric TiO2 sols prepared by the hydrolysis and condensation of titanium isopropoxid
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::60c839bf5a9b4e50342b135a242625bb
https://doi.org/10.1016/s0257-8972(99)00617-9
https://doi.org/10.1016/s0257-8972(99)00617-9