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pro vyhledávání: '"Ndiaye, El Hadji Omar"'
Autor:
Kato, Kokoro, Zine el abidine, Nacer, Sundermann, Frank, Yesilada, Emek, Ndiaye, El Hadji Omar, Mishra, Kushlendra, Paninjath, Sankaranarayanan, Bork, Ingo, Buck, Peter, Toublan, Olivier, Schanen, Isabelle
Publikováno v:
Photomask Japan 2014
Photomask Japan 2014, Jul 2014, Yokohama, Japan. pp.925603, ⟨10.1117/12.2069977⟩
Photomask Japan 2014, Jul 2014, Yokohama, Japan. pp.925603, ⟨10.1117/12.2069977⟩
Standard OPC models consist of a physical optical model and an empirical resist model. The resist model compensates the optical model imprecision on top of modeling resist development. The optical model imprecision may result from mask topography eff
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ea2c0b362eaf6ce0a099a40cf04a70b3
https://doi.org/10.1117/12.2069977
https://doi.org/10.1117/12.2069977
