Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Natsuko Sagawa"'
Publikováno v:
The Journal of Physical Chemistry C. 113:4260-4262
We synthesized a series of n-octadecylsiloxanes having different empirical formulas, that is, R-SiO3/2 (R = C18H37), R-(CH3)SiO2/2, and R-(CH3)2SiO1/2. We found that the compound with the formula R-SiO3/2 shows the highest PL emission with a quantum
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1d0a181433f39714a0071cc18c16006a
https://doi.org/10.1021/jp900911v
https://doi.org/10.1021/jp900911v
Publikováno v:
SPIE Proceedings.
Immersion scanner performance is being improved generation by generation. Faster scan speed is required to increase scanner productivity. There are, however, several papers reporting defect increase with higher scan speed 1, 2, 3 . To overcome this c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e5716220f50720559d66a362274187b0
https://doi.org/10.1117/12.916271
https://doi.org/10.1117/12.916271
Autor:
Yuuki Ishii, Yasuhiro Iriuchijima, Natsuko Sagawa, Katsushi Nakanob, Hamid R. Khorram, Tadamasa Kawakubo, Shirou Nagaoka, Tomoharu Fujiwara
Publikováno v:
Advances in Resist Materials and Processing Technology XXVI.
Immersion lithography has gone through its first phase of introduction and acceptance as the main solution for critical layer lithography for 45nm node and beyond. In this phase, the industry has found that immersion technology has its own unique cha
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e7407764aba220effec50c73fd76bbd4
https://doi.org/10.1117/12.814946
https://doi.org/10.1117/12.814946
Autor:
Takashi Uchino, Natsuko Sagawa
We have found that the adsorption of octadecyltrichlorosilane (OTS) monolayers on nanometer-sized silica particles yields a stable blue photoluminescence (PL) with a time scale of nanoseconds (N. Sagawa and T. Uchino, Appl. Phys. Lett. 87, 251923 (20
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9eef935f175b54dde33a9a2b5f1cc81d
https://hal.archives-ouvertes.fr/hal-00166755
https://hal.archives-ouvertes.fr/hal-00166755
Publikováno v:
Physical Review B. 73(23):233203-233203
We propose a model of the blue-light-emitting center in silicon and silica-based materials on the basis of the density functional theory calculations. It has been shown that the dehydroxylation reaction involved in the annealing process of surface hy
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::98c22c10563153911cc3731f28a4ccd8
https://hdl.handle.net/20.500.14094/90000286
https://hdl.handle.net/20.500.14094/90000286
Autor:
Yang, Liuhua1,2 (AUTHOR) lihongzxl@126.com, Wang, Hongjiang1 (AUTHOR) pedrozhxu@gmail.com, Li, Hong1 (AUTHOR), Zhou, Xu1 (AUTHOR)
Publikováno v:
Minerals (2075-163X). Apr2019, Vol. 9 Issue 4, p240. 1p.
Cost of Ownership/Yield Enhancement of High Volume Immersion Lithography Using Topcoat-Less Resists.
Autor:
Khorram, Hamid R., Nakano, Katsushi, Sagawa, Natsuko, Fujiwara, Tomoharu, Iriuchijima, Yasuhiro, Sei, Toshihiko, Takahiro, Tomioka, Nakamura, Keichi, Shiraishi, Kenichi, Hayashi, Tsunehito
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing; Feb2012, Vol. 25 Issue 1, p63-71, 9p
Cost of Ownership/Yield Enhancement of High Volume Immersion Lithography Using Topcoat-Less Resists.
Autor:
Khorram, Hamid R., Nakano, Katsushi, Sagawa, Natsuko, Fujiwara, Tomoharu, Iriuchijima, Yasuhiro, Sei, Toshi, Takahiro, Tomioka, Nakamura, Keichi, Shiraishi, Kenichi, Hayashi, Tsunehito
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing; 05/01/2011, Vol. 24 Issue 2, p173-181, 9p
Autor:
Sagawa, Natsuko, Uchino, Takashi
Publikováno v:
Applied Physics Letters; 12/19/2005, Vol. 87 Issue 25, p251923, 3p, 1 Diagram, 3 Graphs