Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Natraj Narayanswami"'
Autor:
Natraj Narayanswami, Greg Thomes, James Weygand, Jeffery Butterbaugh, Seong-Ho Yoo, Benjamin Liu, Dennis Paul, Juergen Scherer, Lawrence Davis, Kenton Childs
Publikováno v:
Particles on Surfaces: Detection, Adhesion and Removal, Volume 7 ISBN: 9780429070716
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::427beacf887f888e28c87641fd2e687b
https://doi.org/10.1201/9780429070716-8
https://doi.org/10.1201/9780429070716-8
Publikováno v:
Solid State Phenomena. :259-262
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6477b510a8de5c576bd7141c1acc2ca1
https://doi.org/10.4028/www.scientific.net/ssp.76-77.259
https://doi.org/10.4028/www.scientific.net/ssp.76-77.259
Autor:
Natraj Narayanswami
Publikováno v:
Journal of The Electrochemical Society. 146:767-774
Cryogenic aerosol‐based cleaning has been successfully used to remove contaminant particles from the surface of semiconductor wafers. The aerosol is generated by the expansion of an inert gas such as argon or nitrogen. Particles are dislodged by me
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6f46f91139dae38a32a125b4936bf88c
https://doi.org/10.1149/1.1391679
https://doi.org/10.1149/1.1391679
Autor:
S. Nelson, Natraj Narayanswami
Publikováno v:
Solid State Phenomena. :157-160
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b2b5d2b10a27d16a12179bba0b974ca5
https://doi.org/10.4028/www.scientific.net/ssp.65-66.157
https://doi.org/10.4028/www.scientific.net/ssp.65-66.157
Autor:
Kurt K. Christenson, Lawrence Davis, Benjamin Liu, Juergen Scherer, Natraj Narayanswami, Seong-Ho Yoo, Jeffery W. Butterbaugh, James Weygand
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 19:344
An experimental study of the sizing of submicron particles on semiconductor wafers is presented. The objective of the study was to determine the accuracy of a state-of-the-art optical wafer scanner, by comparing its size response with that of two wel
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::23fe3de4ff146c3f243037ed47a9b14f
https://doi.org/10.1116/1.1352725
https://doi.org/10.1116/1.1352725
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