Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Nathan E. Capps"'
Publikováno v:
Environmental Science & Technology. 36:943-948
Antimony is subject to a lower drinking water standard than arsenic, its notorious group 15 cohort in the periodic table. Both elements often co-vary in nature and are fairly soluble under reducing, alkaline conditions. Of the two, much less is known
Publikováno v:
Chemistry of Materials. 13:2749-2752
Three integrated composites were prepared using plasma polymerization (PP) as a synthetic step. Concentric-tubular Au/polymer composites were prepared by combining the template method and PP. High porosity in the Au nanotubules was seen for the first
Autor:
Elizabeth D. Havey, Michelle L. Steen, Lynley Hymas, Nathan E. Capps, David G. Castner, Ellen R. Fisher
Publikováno v:
Journal of Membrane Science. 188:97-114
A plasma treatment that renders asymmetric polysulfone membranes permanently hydrophilic is reported. Our modification strategy entails treating these membranes downstream from an inductively coupled rf plasma source. Contact angle measurements confi
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 18:2685-2698
The surface reactivity of CF2 radicals has been characterized during plasma processing of a variety of substrates using the imaging of radicals interacting with surfaces technique. The plasma molecular beam sources are 100% C2F6, 50/50 C2F6/H2, and 1
Publikováno v:
Journal of Applied Physics. 84:4736-4743
Surface reactivities for CF2 radicals formed in a CHF3 plasma molecular beam are measured during film deposition on a variety of substrates. The imaging of radicals interacting with surfaces (IRIS) technique was used to collect spatially resolved las
Publikováno v:
Fluorinated Surfaces, Coatings, and Films ISBN: 9780841236233
Fluorinated Surfaces, Coatings, and Films
Fluorinated Surfaces, Coatings, and Films
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e22158c63ac8a646a9ade8ac5bf1e632
https://doi.org/10.1021/bk-2001-0787.ch013
https://doi.org/10.1021/bk-2001-0787.ch013
Publikováno v:
29th AIAA, Plasmadynamics and Lasers Conference.
The surface reactivity of CF2 radicals during plasma processing of Si and 304 stainless steel substrates measured using the imaging of radicals interacting with surfaces (IRIS) technique are reported. The molecular beam source is a 100% CHF3 plasma.
Autor:
DAVID G. CASTNER, DAVID W. GRAINGER, Charlie W. Stewart, Holger Schönherr, G. Julius Vancso, Ken Kojio, Atsushi Takahara, Tisato Kajiyama, Marie Pierre Krafft, Françoise Giulieri, Richard R. Thomas, Jack R. Kirchner, Douglas R. Anton, Sergei S. Sheiko, Peter-Jan Slangen, Maarten Krupers, Ahmed Mourran, Martin Möller, C. Mathew Mate, Robert S. Wilson, Mattias Berglin, Erika Johnston, Kenneth Wynne, Paul Gatenholm, Susan V. Perz, Christopher S. McMillan, Michael J. Owen, V. Castelvetro, M. Aglietto, F. Ciardelli, O. Chiantore, M. Lazzari, Arturo Hale, Kathryn W. Quoi, David J. DiGiovanni, Daisuke Sato, Mitsutoshi Jikei, Masa-aki Kakimoto, Neil M. Mackie, Nathan E. Capps, Carmen I. Butoi, Ellen R. Fisher, Reto Luginbühl, Michael D. Garrison, René M. Overney, Lothar Weiss, Holger Schieferdecker, Sabine Hild, Buddy D. Ratner, M. A. Golub, T. Wydeven, B. A. Banks, S. K. Rutledge, M. C. Kitral
Conference
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