Zobrazeno 1 - 10
of 61
pro vyhledávání: '"Natalia Davydova"'
Autor:
Ilya Korsunskiy, Oleg Blyuss, Maria Gordukova, Natalia Davydova, Alexey Zaikin, Natalia Zinovieva, Sergey Zimin, Robert Molchanov, Aminat Salpagarova, Alina Eremeeva, Maxim Filipenko, Andrey Prodeus, Anatoliy Korsunskiy, Peter Hsu, Daniel Munblit
Publikováno v:
Frontiers in Immunology, Vol 11 (2020)
Primary immunodeficiency diseases (PID) area heterogeneous group of disorders caused by genetic defects of the immune system, which manifest clinically as recurrent infections, autoimmune diseases or malignancies. Early detection of PID remains a cha
Externí odkaz:
https://doaj.org/article/a9b7d8a8ff5b430ebbc81f4dfde990f5
Autor:
Soumya Mukherjee, Celine Dubois, Keyla Perez, Shiji Varghese, Ian E. Birchall, Miranda Leckey, Natalia Davydova, Catriona McLean, Rebecca M. Nisbet, Blaine R. Roberts, Qiao‐Xin Li, Colin L. Masters, Victor A. Streltsov
Publikováno v:
Journal of Neurochemistry. 164:529-552
The two hallmarks of Alzheimer's disease (AD) are amyloid-β (Aβ) plaques and neurofibrillary tangles marked by phosphorylated tau. Increasing evidence suggests that aggregating Aβ drives tau accumulation, a process that involves synaptic degenerat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f118ba71b5e2690dc42af79e6bed1c47
https://doi.org/10.1111/jnc.15713
https://doi.org/10.1111/jnc.15713
Autor:
Bartosz Bilski, Anton van Oosten, Paul Graeupner, Jan van Schoot, Claire van Lare, Joerg Zimmermann, Eelco van Setten, Friso Wittebrood, Jo Finders, Natalia Davydova, Gerardo Bottiglieri, John McNamara, Gijsbert Rispens
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2021.
To enable cost-effective shrink of future devices, a new High-NA EUV platform is being developed. The High-NA EUV scanner employs a novel POB design concept with 0.55NA that enables 8nm HP resolution and a high throughput. In this paper we will discu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7638bfaebd488519aaee4a93a959efc8
https://doi.org/10.1117/12.2600965
https://doi.org/10.1117/12.2600965
Autor:
Ganna Dekusar, Natalia Davydova
Publikováno v:
Theoretical foundations of the functioning of Education. Ways to improve the effectiveness of educational activities
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2c301fd052d801786fb182c7830b1ed3
https://doi.org/10.46299/isg.2021.mono.ped.ii-376-382
https://doi.org/10.46299/isg.2021.mono.ped.ii-376-382
Autor:
Mark John Maslow, Natalia Davydova, Joost Bekaert, Erik Wang, Andreas Frommhold, Gijsbert Rispens, Vineet Vijayakrishnan Nair, David Rio, Tatiana Kovalevich, Remko Aubert, Eric Hendrickx, Joern-Holger Franke
Publikováno v:
Extreme Ultraviolet (EUV) Lithography XII.
We evaluated the printability of patterns relevant for Logic Metal at P28nm (L/S and T2T) on wafer using EUV single expose. We compare illumination sources with and without fading correction as well as Bright field / Dark field mask tonalities and NT
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::99d97857c611bed29b7c38c370aadeac
https://doi.org/10.1117/12.2584733
https://doi.org/10.1117/12.2584733
Autor:
Mark John Maslow, Vincent Wiaux, Eric Hendrickx, Joost Bekaert, Tatiana Kovalevich, Julien Ryckaert, Laurens de Winter, Kars Zeger Troost, Ming-Chun Tien, Natalia Davydova, Pieter Woltgens
Publikováno v:
Extreme Ultraviolet Lithography 2020.
Anamorphic imaging enables NA=0.55 in future EUV systems. At unchanged reticle size, the maximum on-wafer image size is reduced from the today’s full-field to a half-field of 26mm by16.5mm. Though most of the applications use a chip smaller than a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c2f072b05091e0dbce3caf61c8c4147d
https://doi.org/10.1117/12.2573155
https://doi.org/10.1117/12.2573155
Autor:
Andreas Frommhold, Natalia Davydova, Grizelda Kersteen, Joseph Zekry, John McNamara, Renzo Capelli, Timon Fliervoet, Rene Carpaij, Eelco van Setten, Claire van Lare, Joern-Holger Franke, Jo Finders, Andreas Verch
Publikováno v:
Extreme Ultraviolet Lithography 2020.
DUV lithography has successfully adopted both bright and dark mask tonalities. This gives the freedom to chip manufacturers to choose the optimum combination of mask and resist tonality for their product [1]. In EUV lithography, however, there has be
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ae88dec7e3014340a23cc05abaee6794
https://doi.org/10.1117/12.2573161
https://doi.org/10.1117/12.2573161
Autor:
Anton van Oosten, Timon Fliervoet, Eelco van Setten, Joern-Holger Franke, Gerardo Bottiglieri, Rene Carpaij, Dong-Seok Nam, Fei Liu, Natalia Davydova, Vincent Wiaux, Joseph Zekry, John McNamara, Patrick P. Naulleau, Markus P. Benk, Ken Goldberg
Publikováno v:
Extreme Ultraviolet Lithography 2020.
The next-generation high-NA EUV scanner is being developed to enable patterning beyond the 3-nm technology node. Design and development of the scanner are based on rigorous litho-simulations. It is important to verify key imaging simulation findings
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::52b7865a00d92bb9a6d496972edee69d
https://doi.org/10.1117/12.2572846
https://doi.org/10.1117/12.2572846
Autor:
Natalia Davydova, Muharrem Bayraktar, Mark van de Kerkhof, Fei Liu, Marieke Meeuwissen, Xueqing Zhang, Robert de Kruif
Publikováno v:
Journal of micro/nanolithography, MEMS, and MOEMS, 19(3):033801. SPIE
With the introduction of the NXE:3400B scanner, ASML has brought extreme ultraviolet lithography (EUV) to high-volume manufacturing (HVM). The high-EUV power of >200 W being realized with this system satisfies the throughput requirements of HVM, but
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2c34b29337178773696c6771523b4486
https://doi.org/10.1117/1.jmm.19.3.033801
https://doi.org/10.1117/1.jmm.19.3.033801
Autor:
Victor A Streltsov, Musarat Ishaq, Marc G. Achen, Steven P. Williams, Nicole C. Harris, Natalia Davydova, Sophie Paquet-Fifield, Steven A. Stacker, Sally Roufail, Tara Karnezis
Publikováno v:
The Journal of Biological Chemistry
VEGF-C and VEGF-D are secreted glycoproteins that induce angiogenesis and lymphangiogenesis in cancer, thereby promoting tumor growth and spread. They exhibit structural homology and activate VEGFR-2 and VEGFR-3, receptors on endothelial cells that s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9c6ce971c46b6a00a57440e838b267c3
https://doi.org/10.1074/jbc.m116.736801
https://doi.org/10.1074/jbc.m116.736801