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Autor:
Vladimir S. Khramov, K. N. Nishchev, M. I. Novopol'tsev, Natalia A. Ruzavina, Ekaterina N. Lyutova
Publikováno v:
2016 14th International Baltic Conference on Atomic Layer Deposition (BALD).
The thickness of aluminum oxide thin films fabricated by technology of atomic layer deposition with different number of cycles measured by small angle X-ray scattering. The dependence of the film thickness in the range of 20–120 nm from the number
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::db166ea7cf8dc9507f18905a9d46fa9f
https://doi.org/10.1109/bald.2016.7886524
https://doi.org/10.1109/bald.2016.7886524
