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pro vyhledávání: '"Narek E. Koucherian"'
Publikováno v:
Micromachines, Vol 13, Iss 10, p 1583 (2022)
Dry film photoresists are widely employed to fabricate high-aspect-ratio microstructures, such as molds for microfluidic devices. Unlike liquid resists, such as SU-8, dry films do not require a cleanroom facility, and it is straightforward to prepare
Externí odkaz:
https://doaj.org/article/4723e4d530364f5aa6cceb2396a0a25f