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Publikováno v:
Thin Solid Films. 575:110-112
Hydrogen radical cleaning using the hot-wire (HW) method is considered the future technology for the optical system of extreme ultraviolet lithography (EUVL). However, the optical system of EUVL has a low heat resistance. Therefore, it is necessary t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cbbecd262a7ad4a5aeca8e9c8e472c1c
https://doi.org/10.1016/j.tsf.2014.10.030
https://doi.org/10.1016/j.tsf.2014.10.030
