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of 7
pro vyhledávání: '"Naomichi Ohashi"'
Autor:
Naomichi Ohashi, Andy Behr, Hirohisa Hino, Suzuki Yasuhiro, Atsushi Yamaguchi, Yasuo Fukuhara
Publikováno v:
2017 IEEE 67th Electronic Components and Technology Conference (ECTC).
SAC305 solder paste is commonly used electronic assembly. This solder alloy consists of 96.5% tin, 3% silver, and 0.5% copper and melts at 219 °C. The peak reflow temperature range is typically 240 - 260 °C. With electronic devices such as smartpho
Autor:
Hidenori Suzuki, Toshiaki Ohta, Hiroshi Kondoh, Naomichi Ohashi, Akihito Imanishi, Yoshihiro Nakato
Publikováno v:
The Journal of Physical Chemistry C. 113:17254-17261
The adsorption properties of n-TiO2 rutile (100) and (110) surfaces which were prepared by simply annealing, photoetching, and HF-annealing methods were investigated by using the C K-edge NEXAFS. It was revealed that the interaction between the subst
Publikováno v:
Inorganica Chimica Acta. 361:778-782
The crystal-face dependence of the dye-sensitized photocurrents and the adsorption properties of benzothiazole merocyanine (Mc[18,1]) dye molecules were investigated, using atomically flat (1 0 0) and (1 1 0) TiO 2 single crystal surfaces. From the e
Publikováno v:
Journal of the American Chemical Society. 129:11569-11578
The mechanism of water photooxidation reaction at atomically flat n-TiO2 (rutile) surfaces was investigated in aqueous solutions of various pH values, using photoluminescence (PL) measurements. The PL bands, which peaked at around 810 and 840 nm for
Publikováno v:
Journal of the American Chemical Society. 127:12975-12983
The success in preparing atomically smooth and stable (110) and (100) TiO2 (rutile) surfaces, combined with in situ photoluminescence (PL) and photocurrent measurements as well as atomic force microscopic (AFM) inspection, has enabled us to make syst
Autor:
Hideomi Koinuma, Ryuhei Nakamura, Naomichi Ohashi, Yoshihiro Nakato, Takeo Osawa, Yuji Matsumoto, Akihito Imanishi
Publikováno v:
The Journal of Physical Chemistry B. 109:1648-1651
Essentially atomically smooth (100) and (110) n-TiO(2) (rutile) surfaces were prepared by immersion of commercially available single-crystal wafers in 20% HF, followed by annealing at 600 degrees C in air. The obtained surfaces were stable in aqueous
Publikováno v:
Journal of the American Chemical Society. 129(37)
The mechanism of water photooxidation reaction at atomically flat n-TiO(2) (rutile) surfaces was investigated in aqueous solutions of various pH values, using photoluminescence (PL) measurements. The PL bands, which peaked at around 810 and 840 nm fo