Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Naoko Tsugama"'
Autor:
Takeshi Ohfuji, Curt A. Jackson, Shiho Sasaki, Daisuke Totsukawa, Hiroyuki Inomata, Masaaki Kurihara, Naoki Kitano, Naoya Hayashi, Yoshio Murata, David H. Hwang, Naoko Tsugama
Publikováno v:
SPIE Proceedings.
CD uniformity and MTT (Mean to Target) control are very important in mask production for the 90nm node and beyond. Although it is well known that baking temperatures influence CD control in the CAR (chemically amplified resist) process for mask patte
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6b44a02b55f10d8d4dc96c726800010f
https://doi.org/10.1117/12.468089
https://doi.org/10.1117/12.468089
Publikováno v:
Advances in Resist Technology and Processing XVII.
The present paper examines the applicability of three basic resist types (acetal, hybrid, t-butylester) to print sub-0.2 micrometer contact holes (C/H) using state-of-the-art illumination and processing techniques. In terms of ultimate resolution and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bfb18f51aaf6827281bfe01ea34795ee
https://doi.org/10.1117/12.388360
https://doi.org/10.1117/12.388360