Výsledky vyhledávání - "Naoko Shirota"

Development of Novel Materials for 193-nm Dry and Immersion Lithography

Autor: Naoko Shirota, Yoko Takebe, Shu-Zhuong Wang, Sasaki Takashi, Osamu Yokokoji

Publikováno v: Journal of Photopolymer Science and Technology. 19:573-578

We earlier developed new monocyclic fluoropolymers (FUGU) for F2 resist materials. But, it is necessary for FUGU to be improved in their characteristics, especially in the dry-etching resistance, in order to apply to ArF lithography at fine design ru

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::f740310c39a49a06d1267e0900517e4c
https://doi.org/10.2494/photopolymer.19.573

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Development of new resist materials for 193-nm dry and immersion lithography

Autor: Naoko Shirota, Sasaki Takashi, Osamu Yokokoji, Yoko Takebe

Publikováno v: Microelectronic Engineering. 83:1091-1093

We earlier developed new monocyclic fluoropolymers (FUGU) for F 2 resist materials. But, it is necessary for FUGU to improve of their characteristics, especially the dry-etching resistance, in order to apply for ArF lithography at fine design rules.

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c8e79e3ae293805f6bb5ca459fa739c6
https://doi.org/10.1016/j.mee.2006.01.024

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Highly hydrophobic materials for ArF immersion lithography

Autor: Naoko Shirota, Osamu Yokokoji, Koichi Murata, Sasaki Takashi, Yoko Takebe

Publikováno v: Advances in Resist Materials and Processing Technology XXV.

In immersion lithography, the impact of water on resist performance and the possibility of damage to the lens by the components eluted from the resist material are seriously concern. And much work has shown that controlling the water-resist interface

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::80e130995ba9e80613fd39975fb09261
https://doi.org/10.1117/12.772525

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Development of top coat materials for ArF immersion lithography

Autor: Naoko Shirota, Sasaki Takashi, Yoko Takebe, Osamu Yokokoji

Publikováno v: SPIE Proceedings.

We have investigated higher hydrophobic developer-soluble topcoat by combination of developer-soluble unit with higher hydrophobic unit. We have already reported a series of fluoropolymers, FUGU having a partially fluorinated monocyclic structure and

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::e84613dfcfcac5a4cc1cc354f29e6c0d
https://doi.org/10.1117/12.711867

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Development of non-topcoat resist polymers for 193-nm immersion lithography

Autor: Yoko Takebe, Osamu Yokokoji, Shu-Zhong Wang, Naoko Shirota, Sasaki Takashi

Publikováno v: SPIE Proceedings.

Recently it is known well that blending hydrophobic additives into conventional resist polymer drastically improve its film surface hydrophobicity. So we thought that this approach was one of candidates and most promising to achieve a non-topcoat res

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::cba43f836e1b878e9890fd6a67238324
https://doi.org/10.1117/12.712057

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Development of fluoropolymer for 193nm immersion lithography

Autor: Osamu Yokokoji, Yoko Takebe, Naoko Shirota, Minoru Toriumi, Hiroshi Masuhara, Sasaki Takashi

Publikováno v: SPIE Proceedings.

We had already developed several series of fluoropolymers, FPRs and FUGUs, having a partially fluorinated monocyclic structure and having acidic hydroxyl group, which acts as dissolution unit into alkaline solution. Then we have optimized these polym

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::a354b28954f1dd46627a87e50aa80870
https://doi.org/10.1117/12.656234

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