Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Nancy Dudash"'
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 6:2938-2944
A steady‐state model based on a silicon material balance has been proposed to predict the oxygen reactive‐ion‐etching resistance of organosilicon polymers. This model assumes that the rate determining step is sputtering of SiO2 film that forms
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6d0580dea38f711693cfec9afbbee2d4
https://doi.org/10.1116/1.575455
https://doi.org/10.1116/1.575455
Publikováno v:
SPIE Proceedings.
A steady-state model has been proposed to predict the oxygen reactive-ion-etching resistance of organosilicon polymers. This model is based on a Silicon material balance and the assumption that a protective Si02 film forms and reaches a steady-state
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f68dbcd41bee543e7710ca2daac10364
https://doi.org/10.1117/12.968326
https://doi.org/10.1117/12.968326