Comparison of HfO[sub 2] films grown by atomic layer deposition using HfCl[sub 4] and H[sub 2]O or O[sub 3] as the oxidant.

Autor: Hong Bae Park, Moonju Cho, Y. S., Jaehoo Park, Y. S., Suk Woo Lee, Y. S., Cheol Seong Hwang, Jong-Pyo Kim, Y. S., Jong Ho Lee, Nae In Lee, Y. S., Ho Kyu Kang, Y. S., Jong Cheol Lee, Y. S., Se Jung Oh, Y. S.

Publikováno v: Journal of Applied Physics; 9/1/2003, Vol. 94 Issue 5, p3641, 7p, 2 Black and White Photographs, 1 Chart, 7 Graphs