Zobrazeno 1 - 10
of 38
pro vyhledávání: '"Nadir S. Faradzhev"'
Publikováno v:
Surface and Interface Analysis. 49:1187-1205
We discuss the problem of quantifying common sources of statistical uncertainties for analyses of trace levels of surface contamination using X-ray photoelectron spectroscopy. We examine the propagation of error for peak-area measurements using commo
Publikováno v:
Surface and Interface Analysis. 49:1214-1224
We discuss analyses of trace levels of surface contamination using X-ray photoelectron spectroscopy (XPS). The problem of quantifying common sources of statistical and systematic uncertainties for these measurements is formulated in terms of the need
Autor:
Shannon B. Hill, Nadir S. Faradzhev
Publikováno v:
Surface Science. 652:200-205
Previously we reported estimates of the maximum etch rates of C on TiO2 by oxidizers including NO, O3 and H2O2 when irradiated by a spatially-non-uniform beam of extreme ultraviolet (EUV) radiation at 13.5 nm (Faradzhev et al., 2013). Here we extend
Publikováno v:
The Journal of Physical Chemistry C. 117:23072-23081
We report the photodeposition of a carbonaceous layer grown on a TiO2 thin film by extreme ultraviolet (EUV)-induced chemistry of adsorbed n-tetradecane and the subsequent photo-oxidation of this film. Chemical analysis of the carbonaceous layer indi
Autor:
Nadir S, Faradzhev, Shannon B, Hill
Publikováno v:
Surface science. 652
Previously we reported estimates of the maximum etch rates of C on TiO2 by oxidizers including NO, O3 and H2O2 when irradiated by a spatially-non-uniform beam of extreme ultraviolet (EUV) radiation at 13.5 nm (Faradzhev et al., 2013). Here we extend
Autor:
Thomas B. Lucatorto, B. V. Yakshinskii, Theodore E. Madey, Shannon B. Hill, Nadir S. Faradzhev
Publikováno v:
Bulletin of the Russian Academy of Sciences: Physics. 74:28-32
In this paper we discuss surface phenomena leading to contamination of multilayer optics designed for Extreme Ultraviolet (EUV) lithography. Experimental data supported by calculations indicate dramatic influence of resonance structure of EUV mirror
Autor:
Nadir S. Faradzhev, Vadim Sidorkin
Publikováno v:
Journal of Vacuum Science & Technology A, 27 (2), 2009
The authors report on the interaction of atomic hydrogen with Sn and thin Ru film at room temperature. The study is done using a combination of photoelectron and low energy ion scattering spectroscopies as well as scanning electron microscopy. The ad
Publikováno v:
Applied Surface Science. 253:1691-1708
One of the most promising methods for next generation device manufacturing is extreme ultraviolet (EUV) lithography, which uses 13.5 nm wavelength radiation generated from freestanding plasma-based sources. The short wavelength of the incident illumi
Publikováno v:
Chemical Physics Letters. 415:165-171
To clarify conflicting reports on the composition and stability of H2O and D2O adsorbates on Ru(0 0 0 1), we have conducted correlated experiments in two laboratories using X-ray photoelectron spectroscopy and thermal desorption spectroscopy, without
Publikováno v:
International Reviews in Physical Chemistry. 23:289-340
The focus of this review is the effect of H2O on the electron-driven chemistry of condensed halogenated compounds. We present data with emphasis on results from the authors’ laboratories for halomethanes (CF2Cl2, CCl4, CH3I, CDCl3, CD2Cl2) and SF6.