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Study of High Aspect Ratio NLD Plasma Etching and Postprocessing of Fused Silica and Borosilicate Glass

Autor: Mohammed Jalal Ahamed, Alexander A. Trusov, Andrei M. Shkel, Doruk Senkal

Publikováno v: Journal of Microelectromechanical Systems, vol 24, iss 4
Ahamed, MJ; Senkal, D; Trusov, AA; & Shkel, AM. (2015). Study of High Aspect Ratio NLD Plasma Etching and Postprocessing of Fused Silica and Borosilicate Glass. Journal of Microelectromechanical Systems, 24(4), 790-800. doi: 10.1109/JMEMS.2015.2442596. UC Irvine: Retrieved from: http://www.escholarship.org/uc/item/7d36z4jz
Ahamed, MJ; Senkal, D; Trusov, AA; & Shkel, AM. (2015). Study of High Aspect Ratio NLD Plasma Etching and Postprocessing of Fused Silica and Borosilicate Glass. Journal of Microelectromechanical Systems. doi: 10.1109/JMEMS.2015.2442596. UC Irvine: Retrieved from: http://www.escholarship.org/uc/item/96g05765

© 1992-2012 IEEE. In this paper, we report magnetic neutral loop discharge (NLD) plasma etching of fused silica (FS) and borosilicate glass (BSG), demonstrating high aspect ratio deep etch ( 100~\mu \text{m} ) with vertical walls ( < 3° deviation f

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::fb3e484f192a49c386ebe639ce5ac0f8
https://escholarship.org/uc/item/7d36z4jz

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Deep NLD plasma etching of Fused Silica and Borosilicate Glass

Autor: Mohammed Jalal Ahamed, Alexander A. Trusov, Doruk Senkal, Andrei M. Shkel

Publikováno v: 2013 IEEE SENSORS.

In this paper, we report development of deep plasma etching process for Fused Silica (FS) and Borosilicate Glass (BSG) using magnetic Neutral Loop Discharge (NLD) plasma, achieving a depth of 100 μm, a high aspect ratio of 8:1, nearly vertical walls

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::4e989fbfdd6cbd499f5fa0698ec9c3e7
https://doi.org/10.1109/icsens.2013.6688574

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Low loss SOI-based high-mesa waveguides fabricated using neutral loop discharge (NLD) plasma etching for compact breath-sensing system

Autor: Kiichi Hamamoto, Satoshi Yano, Kosuke Kameyama

Publikováno v: Scopus-Elsevier

SOI-based Si/SiO2high-mesa waveguide has been fabricated by using neutral loop discharge (NLD) plasma etching. Significant loss reduction of about 50%, resulted in 0.3dB/cm propagation loss, has been achieved.

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2a654b01ed2ffcbfe50b7cf5d4c6d9a6
https://doi.org/10.1364/ipnra.2007.iwa7

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Ion implanter with a magnetic neutral loop discharge (NLD) plasma ion source for surface modification

Autor: Y. Ohtsuka, M. Matsuura, H. Yokoo, Y. Sakurada

Publikováno v: 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144).

An ion implanter, the ULVAC ILD-600, which employs a new broad-beam ion source termed a "magnetic neutral loop discharge (NLD) plasma ion source" has been developed. NLD plasma is a high density rf plasma produced in a magnetically neutral loop forme

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::ee3a0f1a73c0a1bf069ef246ddcc4331
https://doi.org/10.1109/iit.1999.812116

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A Novel Deep Hole Etching in NLD Plasma Low GWP Gases

Autor: Yasuhiro Morikawa, K. Suu, Takahide Murayama

Publikováno v: TRANSDUCERS 2007 - 2007 International Solid-State Sensors, Actuators and Microsystems Conference.

As for etching of quartz or glass, CF4 and C3F8 and C4F8 are mainly used. And, much SF6 gas is used for etching of silicon. The case that uses together a C4F8-CVD method is also in sidewall protection film formation. However, these gases have a very

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::42adea288268d009db1013e90e358ed5
https://doi.org/10.1109/sensor.2007.4300077

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