Zobrazeno 1 - 10
of 109
pro vyhledávání: '"NANOMEFOS"'
Publikováno v:
In Precision Engineering 2011 35(4):607-624
Aspherical and freeform optics are applied to reduce geometrical aberrations as well as to reduce the required number of components, the size and the weight of the system. To measure these optical components with nanometre level uncertainty is a chal
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dris___00893::0890da7680a9070b13b546baabdc64d6
http://resolver.tudelft.nl/uuid:10a8108f-5ff7-4b68-a34a-aa4a2dd9770c
http://resolver.tudelft.nl/uuid:10a8108f-5ff7-4b68-a34a-aa4a2dd9770c
Autor:
Henselmans, R., Cacace, L.A., Kramer, G.F.IJ., Rosielle, P.C.J.N., Steinbuch, M., Burge, J.H., Fähnle, O.W., Williamson, R.
Publikováno v:
Burge, J.H.Fähnle, O.W.Williamson, R., Optical Manufacturing and Testing VIII, 4 August 2009 through 5 August 2009, San Diego, CA, 7426
Optical Manufacturing and Testing VIII, 4–5 August 2009, San Diego, CA, USA, 742606-1/11
STARTPAGE=742606;ENDPAGE=1/11;TITLE=Optical Manufacturing and Testing VIII, 4–5 August 2009, San Diego, CA, USA
Optical Manufacturing and Testing VIII, 4–5 August 2009, San Diego, CA, USA, 742606-1/11
STARTPAGE=742606;ENDPAGE=1/11;TITLE=Optical Manufacturing and Testing VIII, 4–5 August 2009, San Diego, CA, USA
Applying aspherical and freeform optics in high-end optical systems can improve system performance while decreasing the system mass, size and number of required components. The NANOMEFOS measurement machine is capable of universal non-contact and fas
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2a2641f3345dc6cfc1d7194ad675b2e4
http://resolver.tudelft.nl/uuid:7e10b243-937a-4172-aeb1-8b7e8291cc39
http://resolver.tudelft.nl/uuid:7e10b243-937a-4172-aeb1-8b7e8291cc39
Applying aspherical and freeform optics in high-end optical systems can improve system performance while decreasing the system mass, size and number of required components. The NANOMEFOS measurement machine is capable of universal non-contact and fas
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dris___00893::dd60c035c54a88e84258096802aa8463
http://resolver.tudelft.nl/uuid:7e10b243-937a-4172-aeb1-8b7e8291cc39
http://resolver.tudelft.nl/uuid:7e10b243-937a-4172-aeb1-8b7e8291cc39
Publikováno v:
International Conference on Space Optics — ICSO 2010.
Applying freeform optics in high-end optical systems can improve system performance while decreasing the system mass, size and number of required components. Their widespread application is however held back by the lack of a suitable metrology method
Publikováno v:
Precision Engineering. 35:607-624
Aspherical and freeform optics are applied to reduce geometrical aberrations as well as to reduce the required number of components, the size and the weight of the system. To measure these optical components with nanometre level uncertainty is a chal
Conference
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.
The NANOMEFOS machine is capable of fast, non-contact and universal measurement of aspheres and freeforms, up to ø500 mm with a measurement uncertainty below 30 nm (2σ). It is now being applied in asphere and freeform production at TNO.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dris___00893::8579c83242b822c2d455b64f72a9f59c
http://resolver.tudelft.nl/uuid:c80d80ad-964c-4471-b445-263ce74aeaff
http://resolver.tudelft.nl/uuid:c80d80ad-964c-4471-b445-263ce74aeaff
Publikováno v:
Optical Fabrication and Testing, OFT 2010, 13-17 June, 2010, Jackson Hole, WY, USA
The NANOMEFOS machine is capable of fast, non-contact and universal measurement of aspheres and freeforms, up to ø500 mm with a measurement uncertainty below 30 nm (2σ). It is now being applied in asphere and freeform production at TNO.
The NANOMEFOS non-contact measurement machine for freeform optics has been completed. The separate short metrology loop results in a stability at standstill of 0.9 nm rms over 0.1 s. Measurements of a tilted flat show a repeatability of 2-4 nm rms, d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dris___01180::6f23a91f81b4156f48f5d5c0034b4062
https://research.tue.nl/en/publications/e1e75852-3f22-43e0-a823-a4c3cb09e6cc
https://research.tue.nl/en/publications/e1e75852-3f22-43e0-a823-a4c3cb09e6cc