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Growth of co-sputtered titanium-strontium films: influence of strontium concentration and ion bombardment

Autor: Simon Jacobi Rosendal, M. Sillassen, Jørgen Bøttiger, S. Louring, N.D. Madsen

Publikováno v: Sillassen, M, Rosendal, S J, Louring, S, Madsen, N D & Bøttiger, J 2014, ' Growth of co-sputtered titanium-strontium films : Influence of strontium concentration and ion bombardment ', Thin Solid Films, vol. 550, pp. 170-176 . https://doi.org/10.1016/j.tsf.2013.10.147

Strontium-containing titanium films were synthesized by non-reactive magnetron sputtering from elemental targets. Three series of depositions were carried out at (1) different relative Sr-to-Ti target powers, (2) different sputter-gas pressures, and

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d2207470af09860ce8f95f200c8f32bd
https://doi.org/10.1016/j.tsf.2013.10.147

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Controlling the deposition rate during target erosion in reactive pulsed DC magnetron sputter deposition of alumina

Autor: A.N. Berthelsen, S. Louring, N.D. Madsen, Bjarke Holl Christensen, Jørgen Bøttiger, K.P. Almtoft, Lars Pleth Nielsen

Publikováno v: Madsen, N D, Christensen, B H, Louring, S, Berthelsen, A N, Almtoft, K P, Nielsen, L P & Bøttiger, J 2012, ' Controlling the deposition rate during target erosion in reactive pulsed DC magnetron sputter deposition of alumina ', Surface and Coatings Technology, vol. 206, no. 23, pp. 4850-4854 . https://doi.org/10.1016/j.surfcoat.2012.05.070
Surface and Coatings Technology

Alumina coatings were synthesized by reactive pulsed DC magnetron sputtering in an industrial-scale deposition system. The aim of this study was to investigate the influence of target erosion (racetrack depth) on the deposition rate. Hysteresis curve

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::dbf30e7d5a98a59c202165a3fe755606
https://doi.org/10.1016/j.surfcoat.2012.05.070

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Microstructural, Mechanical and Tribological Analysis of Nanocomposite Ti-C-N Coatings Deposited by Industrial-Scale DC Magnetron Sputtering

Autor: N.D. Madsen, L. P. Nielsen, Helena Ronkainen, K.P. Almtoft, A.N. Berthelsen, Bjarke Holl Christensen, M. Sillassen, S. Louring, Jørgen Bøttiger

Publikováno v: Louring, S, Madsen, N D, Sillassen, M B, Berthelsen, A N, Christensen, B H, Almtoft, K P, Ronkainen, H, Nielsen, L P & Bøttiger, J 2014, ' Microstructural, Mechanical and Tribological Analysis of Nanocomposite Ti-C-N Coatings Deposited by Industrial-Scale DC Magnetron Sputtering ', Surface and Coatings Technology, vol. 245, pp. 40–48 . https://doi.org/10.1016/j.surfcoat.2014.02.033
Louring, S, Madsen, N D, Sillassen, M, Berthelsen, A N, Christensen, B H, Almtoft, K P, Ronkainen, H, Nielsen, L P & Bøttiger, J 2014, ' Microstructural, mechanical and tribological analysis of nanocomposite Ti-C-N coatings deposited by industrial-scale DC magnetron sputtering ', Surface and Coatings Technology, vol. 245, pp. 40-48 . https://doi.org/10.1016/j.surfcoat.2014.02.033

Nanocomposite coatings consisting of Ti(C,N) nanocrystallites embedded in an amorphous carbon-based matrix were studied. The coatings were deposited by reactive DC magnetron sputtering in an industrial-scale deposition system. The microstructure and

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::fc2baa6c502032dea0c65f4eb1a63224
https://pure.au.dk/portal/da/publications/microstructural-mechanical-and-tribological-analysis-of-nanocomposite-ticn-coatings-deposited-by-industrialscale-dc-magnetron-sputtering(6e6bb82d-e0e8-4a62-a7bd-b9d6c6f7e8f1).html

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Turbostratic-like carbon nitride coatings deposited by industrial-scale direct current magnetron sputtering

Autor: K.P. Almtoft, A.N. Berthelsen, L. P. Nielsen, N.D. Madsen, Jørgen Bøttiger, Bjarke Holl Christensen, S. Louring

Publikováno v: Louring, S, Madsen, N D, Berthelsen, A N, Christensen, B H, Almtoft, K P, Nielsen, L P & Bøttiger, J 2013, ' Turbostratic-like carbon nitride coatings deposited by industrial-scale direct current magnetron sputtering ', Thin Solid Films, vol. 536, pp. 25-31 . https://doi.org/10.1016/j.tsf.2013.03.016

Carbon nitride thin films were deposited by direct current magnetron sputtering in an industrial-scale equipment at different deposition temperatures and substrate bias voltages. The films had N/(N + C) atomic fractions between 0.2 and 0.3 as determi

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c991b491994619951a239c46ff502090
https://pure.au.dk/portal/da/publications/turbostraticlike-carbon-nitride-coatings-deposited-by-industrialscale-direct-current-magnetron-sputtering(e580b097-72e8-4e8c-857a-e2fe74b5deb1).html

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