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Autor:
N. Yu. Lyubovin, Andrey S. Baturin, Yu. Yu. Lebedinskii, V. N. Nevolin, Andrei Zenkevich, E. P. Sheshin
Publikováno v:
Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques. 1:84-89
A complex approach to study the initial stage of degradation of hafnium oxide dielectric films during vacuum thermal annealing up to T = 900°C is proposed. Spreading resistance, Kelvin probe, and force modulation methods are used in addition to surf