Zobrazeno 1 - 10
of 29
pro vyhledávání: '"N. Tsikrikas"'
Autor:
N. Tsikrikas, George Kokkoris, George P. Patsis, Andreas G. Boudouvis, D. Drygiannakis, Evangelos Gogolides, Panagiotis Argitis, Ioannis Raptis
Publikováno v:
Microelectronic Engineering. 85:949-954
Experiments and simulations suggest that low-molecular-weight resist materials could result in low line-edge roughness (LER) which is a critical parameter for the forthcoming technology nodes. Two positive molecular resist architectures are modeled w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0ecc416aa93a0db2e7cbfaf35652cfdb
https://doi.org/10.1016/j.mee.2007.12.072
https://doi.org/10.1016/j.mee.2007.12.072
Publikováno v:
Applied Physics B: Lasers and Optics. 67:563-568
), deuterium (D2), and mixtures of hydrogen and helium (H2/He), versus Raman gas pressure and input pump energy of the pulsed Nd:YAG laser at 355 nm, are reported. Photon conversion efficiencies of 50% and 27% are achieved at the first Stokes lines (
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d7d0661a7c6c44390237a1ff3abfae1c
https://doi.org/10.1007/s003400050546
https://doi.org/10.1007/s003400050546
Publikováno v:
Optics Communications. 134:145-148
A circuit and discharge simulation is presented for a TEA HF laser operating with a He/SF 6 /C 3 H 8 gas mixture. A comparison of the simulated discharge voltage, current, resistance and input power with the corresponding experimental results is pres
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7f466c42540a95c03e2b97070ae4664c
https://doi.org/10.1016/s0030-4018(96)00560-3
https://doi.org/10.1016/s0030-4018(96)00560-3
Publikováno v:
Journal of Physics D: Applied Physics. 29:2806-2810
The influence of the applied voltage pulse polarity on the performance of a HF laser pumped by a sliding surface discharge is investigated. Details are presented for the polarity dependence of the discharge properties as well as for their relation to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::64fb671f9e09dcbf7caec307865d3d40
https://doi.org/10.1088/0022-3727/29/11/012
https://doi.org/10.1088/0022-3727/29/11/012
Publikováno v:
Scopus-Elsevier
The plasma electrode design concept is applied for the first time to an HF laser. The discharge along the surface of a dielectric (sliding discharge) is used as a plasma cathode for the main laser discharge. The laser operates at atmospheric pressure
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f250801ccbfdf02e07d32bf6c29bbb7d
https://doi.org/10.1007/bf01081197
https://doi.org/10.1007/bf01081197
Publikováno v:
SPIE Proceedings.
Electron Beam writing process is essential for EUV mask manufacturing and direct writing. Electron beam lithography simulation tools can provide critical information in the way of obtaining high accuracy results. In the present work a software tool w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::673220c4325824960c55f212c44f6164
https://doi.org/10.1117/12.798804
https://doi.org/10.1117/12.798804
Publikováno v:
SPIE Proceedings.
Strong candidate lithography for the mass production of devices at the 32nm technology node and beyond is extreme ultra violet lithography (EUVL). The mask used in EUVL is a complex set of layers. The material composition and thickness of each layer
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ff13c7a637e55533e9f04d051ecac27f
https://doi.org/10.1117/12.769392
https://doi.org/10.1117/12.769392
Publikováno v:
2007 Digest of papers Microprocesses and Nanotechnology.
The effect of the number of layers of the Mo/Si structure and their relative thickness in terms of incident electron energy, on the backscattering coefficient and on the deposited energy in the resist film for a EUV mask is investigated. Experimental
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2f2291c77f7c938130557d2574ffd98f
https://doi.org/10.1109/imnc.2007.4456108
https://doi.org/10.1109/imnc.2007.4456108
Autor:
Volker Wendel, Ute Jacobi, Jürgen Lademann, Heiner Gers-Barlag, Claudius Rapp, Christina Antoniou, Hans-Ju¨rgen Weigmann, Wolfram Sterry, George N. Tsikrikas
Publikováno v:
Journal of biomedical optics. 10(1)
Penetration profiles of topically applied drugs and cosmetic products provide important information on their efficacy. The application of tape stripping in combination with UV/VIS spectroscopy is checked to determine the local position of topically a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d1d1bb90987718cdd2c784c5d88c1825
https://pubmed.ncbi.nlm.nih.gov/15847590
https://pubmed.ncbi.nlm.nih.gov/15847590
Autor:
Jürgen Lademann, A. Katsambas, U Lindemann, George N. Tsikrikas, Alex Stratigos, Wolfram Sterry, Christina Antoniou, H-J Weigmann
Publikováno v:
Skin pharmacology and applied skin physiology. 16(4)
The accurate determination of the mass of the horny layer removed by tape stripping is a decisive prerequisite for the application of this technique in penetration studies. A novel method using optical spectroscopy to determine the amount of stratum
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2318cf5b3213016e2274feebcdb2ccd4
https://pubmed.ncbi.nlm.nih.gov/12784061
https://pubmed.ncbi.nlm.nih.gov/12784061