Zobrazeno 1 - 10
of 137
pro vyhledávání: '"N. Oudini"'
Oxygen flow rate effect on copper oxide thin films deposited by radio frequency magnetron sputtering
Publikováno v:
Thin Solid Films. 741:139013
Copper oxide thin films are prepared by radio frequency magnetron sputtering technology. The analysis of the deposited films by X-Ray Diffraction (XRD), spectrometry and electrical resistivity measurements is carried out. The results show that the wo
Publikováno v:
ICREEC 2019 ISBN: 9789811554438
Laser pulse induced photo-detachment is an indirect measurement technique devoted for the estimation of plasma electronegativity, i.e. ratio of negative ion density in proportion to electron density. The technique combines the use of a laser pulse an
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::68973acc9367197b95cfa550602f0b52
https://doi.org/10.1007/978-981-15-5444-5_60
https://doi.org/10.1007/978-981-15-5444-5_60
Publikováno v:
Physics of Plasmas. 28:053508
This work investigates, via particle-in-cell with Monte Carlo collision simulations, electron transport across magnetic filter (MF) in obstructed-drift plasma sources. The studied source consists of three stages, namely: the ionization stage where po
Publikováno v:
Plasma Sources Science and Technology. 29:105019
The aim of this paper is to investigate, through particle-in-cell with Monte Carlo collisions (PIC-MCC) simulations, the effects of collisions on the expansion of an ion–ion beam formed by the alternate extraction of oppositely charged ions. This b
Publikováno v:
Plasma Science and Technology. 22:065402
Publikováno v:
Physics of Plasmas. 26:113505
Electron filtering via an external magnetic field barrier is an important issue for volume negative ion production. In this work, we study the plasma properties in an inductively coupled plasma source in the presence of a magnetic filter. Our investi
Autor:
N. Oudini
Publikováno v:
Plasma Sources Science and Technology. 28:065016
Publikováno v:
Advanced Materials Research. 227:144-147
In an End-Hall source an ion-beam is extracted from a magnetized plasma and accelerated by the plasma electric field without grids. The ion beam of End-Hall sources is not space charge limited and ion current as large as 5 A at relatively low energy
Publikováno v:
Physics of Plasmas. 25:053510
We propose a new technique for diagnosing negative ion properties using Langmuir probe assisted pulsed laser photo-detachment. While the classical technique uses a laser pulse to convert negative ions into electron-atom pairs and a positively biased
Publikováno v:
Physics of Plasmas. 25:043505
We study, through two dimensional Particle-In-Cell simulations, the expansion of an ion-ion beam in vacuum. This beam is generated by a continuous extraction of positive and negative ions from two adjacent gridded ion sources. The grid systems are bi