Zobrazeno 1 - 10
of 31
pro vyhledávání: '"N. Mainzer"'
Autor:
E. Zolotoyabko, N. Mainzer
Publikováno v:
Defect and Diffusion Forum. :103-126
Autor:
N. Mainzer, Emil Zolotoyabko
Publikováno v:
Journal of Electronic Materials. 29:792-797
We used high-resolution x-ray diffraction to measure precisely structural modifications in variously composed Hg1−xCdxTe layers which were fabricated by different growth techniques and subjected to boron implantation to form p-n junctions. Analysis
Autor:
Emil Zolotoyabko, N. Mainzer
Publikováno v:
Physical Review B. 60:16715-16721
Using high-resolution x-ray diffraction for precise measurements of structural modifications in boron-implanted ${\mathrm{Hg}}_{1\ensuremath{-}x}{\mathrm{Cd}}_{x}\mathrm{Te}$ layers, we found a percolation problem in the long-range diffusion of Cd in
Publikováno v:
Journal of Electronic Materials. 28:850-853
Absolute values of lattice parameters in Hg1−xCdxTe epilayers were precisely measured by high-resolution x-ray diffraction (Bond method), and then compared with those calculated using Cd contents, x, which were derived from Fourier transform infrar
Publikováno v:
Journal of Crystal Growth. :264-269
The ability of high-resolution X-ray diffraction to provide information on atomic diffusion is analyzed, the focus being on the thin film crystalline structures important to modern microelectronics and optoelectronics. Special attention is paid to th
Publikováno v:
Journal of Crystal Growth. 197:542-546
Structural and compositional parameters of the Hg 1-x Cd x Te layers grown by metal-organic vapor deposition on (2 1 1)-oriented CdTe substrates were investigated by high-resolution X-ray diffraction, high-resolution scanning electron microscopy, ene
Publikováno v:
Journal of Applied Physics. 82:2869-2876
A novel method to obtain diffusion-controlled atomic concentration profiles in II–VI semiconductor heterostructures has been developed using high-resolution x-ray diffraction. Measured diffraction spectra are compared with simulations based on dire
Publikováno v:
Journal of Electronic Materials. 26:606-609
CdTe/Hg1−xCdxTe heterostructures variously heat-treated and implanted with boron were studied by means of high-resolution x-ray diffraction. A novel procedure for simulating diffraction spectra was developed, which is based on direct summation of s
Publikováno v:
Journal of Electronic Materials. 24:1169-1174
In this study, CdTe epilayers were grown by metalorganic chemical vapor deposition on epitaxial HgCdTe with the purpose of developing suitable passivation for HgCdTe photodiodes. Two types of CdTe layers were investigated. One was grown directly,in s
Publikováno v:
Journal of Electronic Materials. 24:1161-1168
The metalorganic chemical vapor deposition (MOCVD) growth of CdTe on bulk n-type HgCdTe is reported and the resulting interfaces are investigated. Metalinsulator-semiconductor test structures are processed and their electrical properties are measured