Zobrazeno 1 - 10
of 58
pro vyhledávání: '"N. Kaluza"'
Publikováno v:
Journal of Crystal Growth. 307:6-13
Undoped GaN epilayers were grown on sapphire (0 0 0 1) substrates using different H 2 /N 2 carrier gas ratios (0%, 50%, 70%, 80%, and 100% N 2 content in the mixtures) in metal organic vapor phase epitaxy (MOVPE). Growth was observed in situ by refle
Autor:
Hilde Hardtdegen, G. Heidelberger, N. Kaluza, H. L. Bay, Michel Marso, Yong Suk Cho, Konrad Wirtz, R. Steins, M. von der Ahe
Publikováno v:
Applied Physics A. 87:491-498
This paper reports on new approaches for growth control of GaN-based heterostructures for high frequency and high power application. First in situ methods are presented and their further development discussed [1]. The development leads to a greatly i
Autor:
Y. S. Cho, Bernd Beschoten, Uwe Breuer, Th. Schäpers, V. A. Guzenko, Hans Lüth, N. Kaluza, M. R. Ghadimi, M. Fecioru-Morariu, H.-P. Bochem, Hilde Hardtdegen
Publikováno v:
physica status solidi (a). 204:72-77
This paper reports on the growth of Cr-doped GaN layers by metal organic vapor phase epitaxy (MOVPE) and their characterization for possible spintronic applications. We have used bis (cyclopentadienyl)chromium (Cp 2 Cr) to intentionally incorporate c
Publikováno v:
Journal of Crystal Growth. 298:413-417
This paper discusses the results of a combined modeling and experimental analysis of AlGaN deposition in the horizontal two-flow AIX 200/4 RF-S reactor. The purpose of this study is to examine conventional and inverted supply of the precursors into t
Publikováno v:
Physica status solidi / C 3, 1408-1411 (2006). doi:10.1002/pssc.200565121
Metalorganic vapor phase epitaxy (MOVPE) of GaN was performed using hydrogen (H2), nitrogen (N2) and H2/N2mixtures thereof as the carrier gas in the high temperature buffer growth range. The effect of carrier gas on the structural and morphological c
Autor:
Y. Dikme, N. Kaluza, R. Steins, H. L. Bay, André Strittmatter, Rolf H. Jansen, Zdeněk Sofer, L. Reißmann, Hilde Hardtdegen, Michael Heuken, Dieter Bimberg, Holger Kalisch, J.-T. Zettler, Y. S. Cho
Publikováno v:
physica status solidi (a). 203:1645-1649
This paper reports on the in situ determination of the Al-content in Al x Ga 1-x N layers deposited by MOVPE on sapphire and silicon substrates by means of optical reflectance. The accuracy of the conventional in situ method which utilizes the depend
Publikováno v:
Journal de physique / 4 132, 177-183 (2006). doi:10.1051/jp4:2006132034
This paper reports on how the observation of the morphology development and growth by in situ optical methods as well as the determination of substrate temperature can be employed to tailor the characteristics of GaN and to control growth in MOVPE (m
Autor:
R. Steins, Hilde Hardtdegen, Y. S. Cho, K. Haberland, J.-T. Zettler, Zdeněk Sofer, Martin Zorn, N. Kaluza
Publikováno v:
physica status solidi (b). 242:2581-2586
In this paper we will first report on the use of real-time determination of wafer temperature for transparent substrates. With this method we will study the unintentional influence of growth parameter variations on the surface temperature. The effect
Autor:
Hilde Hardtdegen, H. L. Bay, Hans Lüth, R. Meijers, Raffaella Calarco, Martina von der Ahe, N. Kaluza, M. Buchmeier, D.E. Bürgler
Publikováno v:
Journal of Crystal Growth. 283:500-507
Fe films of different thicknesses were deposited on wurtzite GaN(0 0 0 1) layers by electron beam evaporation. They were studied by a number of characterization techniques such as low-energy electron diffraction (LEED), X-ray diffraction (XRD), atomi
Publikováno v:
physica status solidi (a). 202:744-748
Using a new susceptor set-up a systematic study on gas phase transport properties was carried out with the aim of obtaining layer uniformity. By determining the influence of the transport parameters on growth it is then possible to achieve symmetric