Zobrazeno 1 - 10
of 35
pro vyhledávání: '"N. I. Plyusnin"'
Autor:
N. I. Plyusnin
Publikováno v:
Physics of the Solid State. 61:2431-2433
Four modes of metal growth on a semiconductor substrate have been detected and distinguished on the basis of experimental data obtained under similar conditions using hot wall epitaxy. These modes are achieved at certain ratios between translational
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::32bf36c3d799fe5cb0fc69d35c534dc1
https://doi.org/10.1134/s1063783419120394
https://doi.org/10.1134/s1063783419120394
Autor:
N. I. Plyusnin
Publikováno v:
Technical Physics Letters. 44:980-983
Based on the data on the atomic density of a film and degree of its homogeneity during the formation of the interface between 3d transition metals (Cr, Co, Fe, or Cu) and silicon, a new concept of forming a contact between a reactive metal and a semi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9ea24c6adf131f7aaf1235ba560b45bc
https://doi.org/10.1134/s1063785018110123
https://doi.org/10.1134/s1063785018110123
Publikováno v:
Technical Physics. 60:1501-1507
The multilayer nanofilms based on ferromagnetic metals (Fe, Co) and a diamagnetic metal (Cu) and deposited onto a Si(001)2 × 1 substrate at a low source temperature are studied by Auger electron spectroscopy, electron-energy loss spectroscopy, low-e
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ca43514ebad0524a3508d642fe5c0ccb
https://doi.org/10.1134/s1063784215100266
https://doi.org/10.1134/s1063784215100266
Publikováno v:
Technical Physics. 59:1017-1026
The growth of a Fe sublayer 1.5–14.0 monolayers (MLs) thick and a Cu film (about 5 MLs) on this sublayer is studied at a reduced temperature (1240°C) and an elevated temperature (1400°C) of a Fe source and at a reduced temperature (900°C) of a C
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fef3846fd9db44ee175a1d75fc236242
https://doi.org/10.1134/s1063784214070238
https://doi.org/10.1134/s1063784214070238
Publikováno v:
Technical Physics Letters. 38:324-327
We have studied the influence of the upper Si monolayer (ML) in Fe-Si interlayers on the mechanism of subsequent growth of 7-ML-thick Cu films during molecular beam deposition. The Fe-Si interlayers and Cu films were studied in ultrahigh vacuum by th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0594732c1f883a01cc8d5bb908f151b0
https://doi.org/10.1134/s1063785012040116
https://doi.org/10.1134/s1063785012040116
Publikováno v:
Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques. 5:734-745
Auger-electron spectroscopy, electron-energy loss spectroscopy, low-energy electron diffraction, and atomic-force microscopy are employed to investigate the growth mechanism, composition, structural and phase states, and morphology of Cu films (0.1
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9d077a1dc686f1eec927d96b10e919d7
https://doi.org/10.1134/s1027451011060140
https://doi.org/10.1134/s1027451011060140
Publikováno v:
Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques. 3:734-746
This paper is devoted to the study of the morphology, growth, electronic structure, and stability of ultrathin (0.03–3 nm) Co and Fe films on the Si(111) and Si(100) surfaces using Auger-electron spectroscopy, electron-energy loss spectrometry, low
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::01e58a1fdefe3ab4bd451375ba635981
https://doi.org/10.1134/s1027451009050139
https://doi.org/10.1134/s1027451009050139
Publikováno v:
Technical Physics Letters. 33:486-489
The interaction of iron atoms with a silicon single crystal substrate and the initial stages of growth in this system have been studied using Auger electron spectroscopy, electron energy loss spectroscopy, and low-energy electron diffraction in the c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::016466c71a8c4da73213b093f7e13e86
https://doi.org/10.1134/s1063785007060132
https://doi.org/10.1134/s1063785007060132
Publikováno v:
Technical Physics. Oct2015, Vol. 60 Issue 10, p1501-1507. 7p. 1 Chart, 4 Graphs.
Autor:
Plyusnin, N. I.1 plusnin@iacp.dvo.ru
Publikováno v:
Technical Physics Letters. Nov2018, Vol. 44 Issue 11, p980-983. 4p.