Zobrazeno 1 - 10
of 101
pro vyhledávání: '"N. Hecking"'
Publikováno v:
Materials Science and Engineering: B. 15:187-191
Analytical expressions for ion ranges and range straggles of ions implanted into a solid state target are presented. The calculations are extended to the high energy case (up to about 1 GeV). It is assumed that the ions lose their energy only by elec
Autor:
N. Hecking, E.H.Te Kaat
Publikováno v:
Applied Surface Science. 43:87-96
Radiation damage after high energy ion irradiation of silicon at temperatures up to 475 K has been investigated by optical reflectivity depth profiling. The damage development with dose is determined by different microprocesses, which are due to the
Autor:
Chan, Frederick H. F.1, Goh, Zack Z. S.1, Xiaoli Zhu1,2, Car, Lorainne Tudor1,3, Newman, Stanton4, Khan, Behram A.5,6, Griva, Konstadina1 konstadina.griva@ntu.edu.sg
Publikováno v:
Health Psychology Review. Dec2023, Vol. 17 Issue 4, p614-640. 27p.
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 15:105-108
12 C and 14 N ions were implanted into silicon with intermediate energies between the validity regions of the LSS and Bethe-Bloch theories. Ranges were determined by optical reflectivity measurements at bevelled samples. A simple fitting formula for
Publikováno v:
Materials Science and Engineering: B. 2:145-156
Lattice damage by megaelectronvolt ion implantation has been investigated using transmission electron microscopy (TEM) and depth-resolved measurements of the optical reflectivity change on bevelled samples. Generally, optical reflectivity depends on
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 15:760-764
Highly resolved damage depth profiles are determined by optical reflectivity measurements after small angle bevelling of the irradiated surface. The dose and temperature dependence of irradiation damage after 2 MeV Si → Si implantation up to doses
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 43:170-175
The dynamic Monte Carlo simulation program HIDOS is presented, which simulates the slowing down of ions in amorphous solids, taking into account composition changes of the target during high dose ion bombardment. Depth profiles of 150 keV N ions in s
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 26:551-556
Radiation damage of crystalline silicon after 5 MeV Au-ion implantation at various temperatures has been studied by optical and electron microscopical methods. Damage at 450 K is analyzed in detail and discussed in comparison to that after 2 MeV Si s
Autor:
Chan, Frederick H. F.1 (AUTHOR), Newman, Stanton2 (AUTHOR), Khan, Behram A.3,4 (AUTHOR), Griva, Konstadina1 (AUTHOR) konstadina.griva@ntu.edu.sg
Publikováno v:
British Journal of Health Psychology. Sep2023, Vol. 28 Issue 3, p651-671. 21p. 5 Charts, 4 Graphs.
Publikováno v:
Journal of Applied Physics; 4/7/2023, Vol. 133 Issue 13, p1-11, 11p