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Electron-beam lithography simulation for EUV mask applications

Autor: G P Patsis, N Glezos

Publikováno v: Journal of Physics: Conference Series. 10:385-388

Extreme-ultraviolet-(EUV) mask fabrication using electron-beam lithography has to eliminate the proximity effect defects, for the accurate representation of the patterned features. One special characteristic of EUV masks is that they contain a multil

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::809190c02ff254935850c45f25648df5
https://doi.org/10.1088/1742-6596/10/1/094

Poster: Electronic Structure, Lattice Dynamics, and Transport

Autor: K. Goss, L. N. Fomicheva, Pedro Prieto, Silvia Karthäuser, N. Glezos, Susagna Ricart, K. H. Michel, V. Rouco, Carola Meyer, Songhak Yoon, Ulrich Simon, S. Ye, Masahiro Tada, Sònia Estradé, Shoji Ishibashi, T. Tungsurat, M. E. Gómez, Mohammad Reza Golobostanfard, Giulia Broglia, Taichi Kosugi, Rainer Jany, Luca Larcher, Thierry Straessle, F. M. Peeters, A. Thatribud, Victor Moshchalkov, P. F. Chen, L. Covaci, M. A. Wilde, Sascha Populoh, C. Spudat, D. Velessiotis, Claus M. Schneider, Alberto Pomar, Paulo R. F. Rocha, E. Longo, P. Argitis, A. Soltow, Isao Tanaka, Dominik Urselmann, Timo Schena, Jaume Gazquez, J. Gutierrez, Stefan Blügel, Hideyuki Yasuda, Gervasi Herranz, J. A. Hirschfeld, Gustav Bihlmayer, Adam W. Franz, Yohei Miyauchi, Pengxiang Xu, Masato Yoshiya, B. W. Zhi, María Jesús Martínez-Lope, Monia Montorsi, José Antonio Alonso, Andrey Shkabko, Roman Nowak, J. Mannhart, D. Chrobak, Fei Zeng, A. I. Velichkov, D. Chataigner, R. Córdoba, Dariusz Chrobak, Christoph Richter, Vladimir Pomjakushin, Werner Dietsche, H. Lustfeld, Christian Colliex, Adam Busiakiewicz, M. Brasse, T. Wyrobek, F. de la Peña, A. A. Sorokin, Jing Yang, Maria Varela, Michael Paßens, Qian Chen, Ch. Heyn, Johan Vanacken, Yisong Lin, A. V. Salamatin, Koichi Niihara, Christoph Stampfer, D. Nasr Esfahani, L. F. Wang, P. Dimitrakis, Stefan C. J. Meskers, J. A Varela, Felip Sandiumenge, J. M. Rebled, Ingrid C. Infante, R. Nowak, Rainer Waser, Anna Palau, A. M. Douvas, Teresa Puig, Hossein Abdizadeh, S. Karthäuser, A. Epping, Roger Guzmán, W. W. Gerberich, Anke Weidenkaff, Thomas Müller, Hans Boschker, M. Budzynski, A. Boonthummo, F. Peiró, Michael Walls, A. Z Simões, R. Waser, Zhishun Wang, G. K. Ryasny, Marisa Medarde, R. Vlad, U. Wichmann, Takashi Miyake, Manuel J. Schmidt, Jochen Mannhart, Anna Llordes, Laurent Chaput, Hiromasa Ohnishi, William W Gerberich, Xavier Obradors, C. Thomsen, M. Müller, L. Houben, Josep Fontcuberta, Dago M. de Leeuw, Andrea Padovani, Leyre Sagarna, Asal Kiazadeh, Marcel Manheller, M. A Ramírez, Stefan Trellenkamp, Stephan Engels, Mariona Coll, Kerstin Blech, Henrique L. Gomes, W. B. Wu, Sizhao Li, A. V. Tsvyashchenko, Jordi Arbiol, Alexandra E. Maegli, César Magén, Janina Maultzsch, X. L. Tan, T. Pengpan, A. V. Nikolaev, Florencio Sánchez, Atsushi Togo, Kiyoyuki Terakura, O. I. Kochetov, Christa S. Barkschat, D. Grundler, Guy Deutscher

Publikováno v: Frontiers in Electronic Materials: A Collection of Extended Abstracts of the Nature Conference Frontiers in Electronic Materials, June 17 to 20 2012, Aachen, Germany

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::de03fc5f82b9dcd5a1bc5884a9f8dbfe
https://doi.org/10.1002/9783527667703.ch66

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