Zobrazeno 1 - 6
of 6
pro vyhledávání: '"N. A. Orlikovskii"'
Autor:
A. V. Myakon’kikh, O. P. Guschin, A. A. Tatarintsev, K. Yu. Kuvaev, E. S. Gornev, Konstantin V. Rudenko, N. A. Orlikovskii
Publikováno v:
Russian Microelectronics. 47:323-331
The processes of plasma etching of stack layers to form a structure of a metal gate of a nanoscale transistor with a dielectric with a high level of dielectric permittivity (HkMG) are investigated. A resist mask formed by fine-resolution electron-bea
Publikováno v:
Technical Physics. 60:1515-1518
A new method for determining the thickness of opaque films on bulk substrates is considered in the nanometer size range. The method is based on analysis and measurements of the energy spectra of back-scat- tered electrons. The thicknesses of local fi
Publikováno v:
Technical Physics. 58:447-454
A new version of the toroidal electron spectrometer installed in a scanning electron microscope is described. The new instrument has made it possible to carry out fundamental and applied research in the field of local nondestructive inspection of mic
Publikováno v:
Bulletin of the Russian Academy of Sciences: Physics. 76:959-964
The inverse problem of reconstructing the true spectrum of electrons backscattered from massive and layered targets with allowance for the spread function of the toroidal sector energy analyzer and for the response function of the spectrometer’s el
Autor:
S. A. Ditsman, R. A. Sennov, N. A. Orlikovskii, A. F. Aleksandrov, E. I. Rau, F. A. Luk’yanov
Publikováno v:
Russian Microelectronics. 39:303-312
An electron-beam diagnostic complex based on a scanning electron microscope is described. The complex allows the nondestructive contactless studies of microelectronic device structures and architectures and the simultaneous determination of the distr
Publikováno v:
Instruments and Experimental Techniques. 53:581-590
A method of microtomography of layered microstructures during detection of backscattered electrons in a scanning electron microscope is described. This method is based on the formation of layer-by-layer images hidden under the surfaces of microstruct