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pro vyhledávání: '"N Edavalath Hritwik"'
Autor:
Choi Jae Won, Prabhakaran Prem, N Edavalath Hritwik, Dupont Maxime, Kim Jongsu, Cheng Xiangming, Ha Cheol Woo, Lee Ji-Sun, Han Jisu, Son Yong, Yeon Si-Mo
Publikováno v:
Materials & Design, Vol 212, Iss, Pp 110226-(2021)
Hydrogel precursor photoresists (HPR) are being studied widely due to the close similarities between HPR cured microstructures and biological materials. A vast majority of such resists are formulated in water and suffer from swelling-related inhomoge