Zobrazeno 1 - 10
of 64
pro vyhledávání: '"N, Linhart"'
Autor:
Jason J. Keleher, Alexis D. Ostrowski, Amie E. Norton, Giuseppe E. Giammanco, M H Jayan S Karunarathna, Jackson J. Chory, Abigail N. Linhart
Publikováno v:
ACS Applied Bio Materials. 4:5765-5775
Coordination of Fe(III) to carboxylates in polyuronic acid hydrogels was used to impart photochemical reactivity to polysaccharide-based hydrogels. This photochemical reaction was then used for light-initiated polymerization to create hydrogels with
Autor:
Jason J. Keleher, Allie M. Mikos, Katherine M. Wortman-Otto, Kiana A. Cahue, Abigail N. Linhart
Publikováno v:
Solid State Phenomena. 314:237-246
Due to the emergence of sub-7 nm technologies, next generation CMP slurry formulations have continued to increase in additive (nanoparticle and chemistry) complexity to meet stringent device specifications. Therefore, it is essential to probe the mol
Endomyocardial biopsy (EMB) is an invasive procedure, globally most often used for the monitoring of heart transplant rejection. In addition, EMB can have an important complementary role to the clinical assessment in establishing the diagnosis of div
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od______2127::364a5851346fef831d799ec0dcac6086
https://pergamos.lib.uoa.gr/uoa/dl/object/uoadl:3029844
https://pergamos.lib.uoa.gr/uoa/dl/object/uoadl:3029844
Autor:
Jason J. Keleher, Kiana A. Cahue, Katherine M. Wortman-Otto, Abigail N. Linhart, Adam T Caridi, Abigail L. Dudek
Publikováno v:
ECS Meeting Abstracts. :655-655
Publikováno v:
ECS Journal of Solid State Science and Technology. 10:063001
As technology continues to expand beyond that predicted by Moore’s Law the need to alter chemical mechanical planarization (CMP) processes to meet consumer demands is critical. To achieve higher oxide material removal rates (MRR), slurry formulatio
Autor:
D. Tamboli, Wei-Tsu Tseng, Abigail N. Linhart, Jason J. Keleher, Katherine M. Wortman-Otto, Ara Philipossian, Yasa Sampurno
Publikováno v:
ECS Journal of Solid State Science and Technology. 10:064011
Results from a series of post-CMP PVA scrubbing marathon runs performed in a high-volume manufacturing fab are scientifically explained via a series of controlled laboratory tests. The major differences in the ingredients within the cleaning solution
Autor:
Abigail N. Linhart, Jason J. Keleher
Publikováno v:
ECS Meeting Abstracts. :810-810
With the miniaturization of device features, slurry chemistries have become increasingly complex and therefore require enhancement of current cleaning processes. Copper (Cu) chemical mechanical planarization (CMP), a critical process step in the fabr
Autor:
Katherine M. Wortman-Otto, Ara Philipossian, Yasa Sampurno, Abigail N. Linhart, Jason J. Keleher
Publikováno v:
ECS Journal of Solid State Science and Technology. 10:034002
After defining certain sign conventions for sliding velocity and shear force for a PVA brush scrubbing process, a simple kinematics model is used to calculate net sliding velocities in the brush-wafer contact region. Next, a series of experiments are
Autor:
Jason J. Keleher, Carolyn F. Graverson, Ara Philipossian, Yasa Sampurno, Katherine M. Wortman-Otto, Abigail N. Linhart
Publikováno v:
Materials Chemistry and Physics. 259:124170
Understanding the chemical and mechanical components of supramolecular cleaning chemistries for post-STI CMP cleaning is paramount in reducing defectivity for the continued miniaturization of advanced technologies. Therefore, macroscopic cleaning per
Autor:
Brian M. Sherry, Katherine M. Wortman-Otto, Abigail L. Dudek, Abigail N. Linhart, Jason J. Keleher
Publikováno v:
ECS Journal of Solid State Science and Technology. 10:024009
As feature sizes continue to shrink well beyond the 7 nm node, understanding the delicate balance present in the chemical mechanical planarization (CMP) process is of utmost importance. In order to achieve high through-put and defect-free CMP process