Atomic layer deposition of LiF using LiN(SiMe

Autor: N, Hornsveld, W M M, Kessels, R A, Synowicki, M, Creatore

Publikováno v: Physical chemistry chemical physics : PCCP. 23(15)

Lithium fluoride films were prepared by atomic layer deposition (ALD) using a new route in which LiN(SiMe

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=pmid________::1e35f41ef4f09256bdf8b9d5edc0647c
https://pubmed.ncbi.nlm.nih.gov/33885050

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Interface-Engineered Atomic Layer Deposition of 3D Li 4 Ti 5 O 12 for High-Capacity Lithium-Ion 3D Thin-Film Batteries.

Autor: Speulmanns J; Center Nanoelectronic Technologies, Fraunhofer Institute for Photonic Microsystems, An der Bartlake 5, 01109, Dresden, Germany.; Department of Chemistry, Humboldt-University Berlin, Brook-Taylor-Strasse 2, 12489, Berlin, Germany., Bönhardt S; Center Nanoelectronic Technologies, Fraunhofer Institute for Photonic Microsystems, An der Bartlake 5, 01109, Dresden, Germany., Weinreich W; Center Nanoelectronic Technologies, Fraunhofer Institute for Photonic Microsystems, An der Bartlake 5, 01109, Dresden, Germany., Adelhelm P; Department of Chemistry, Humboldt-University Berlin, Brook-Taylor-Strasse 2, 12489, Berlin, Germany.; Joint research group Operando Battery Analysis (CE-GOBA), Helmholtz-Zentrum Berlin für Materialien und Energie, Hahn-Meitner-Platz 1, 14109, Berlin, Germany.

Publikováno v: Small (Weinheim an der Bergstrasse, Germany) [Small] 2024 Oct; Vol. 20 (42), pp. e2403453. Date of Electronic Publication: 2024 Jun 08.

LixCoyOz thin-films deposition through thermal atomic layer deposition.

Autor: Peisert, Antoine, Adjeroud, Noureddine, Lenoble, Damien, Lamblin, Guillaume

Publikováno v: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Dec2023, Vol. 41 Issue 6, p1-9, 9p