Zobrazeno 1 - 10
of 13
pro vyhledávání: '"Myoung-Soo Yun"'
Publikováno v:
Journal of the Korean institute of surface engineering. 49:92-97
The plasma has been used in various industrial fields of semiconductors, displays, transparent electrode and so on. Plasma diagnostics is critical to the uniform process and the product. We use the electron temperature of the various plasma parameter
Autor:
Myoung Soo Yun, Gi-Chung Kwon, In Tae Kim, Guangsup Cho, Sang hun Kim, Park Jong-In, Eun Ha Choi, Je Huan Koo
Publikováno v:
Journal of the Korean institute of surface engineering. 47:227-232
Kwangwoon University of Department of Chemistry, Seoul, Korea(Received October 8, 2014 ; revised October 22, 2014 ; accepted October 23, 2014)Abstract In this study, we propose the application of doping process technology for atmospheric pressure pla
Publikováno v:
Journal of the Korean Institute of Illuminating and Electrical Installation Engineers. 27:95-99
Furnace is currently the most important doping process using POCl3 in solar cell. However furnace need an expensive equipment cost and it has to purge a poisonous gas. Moreover, furnace typically difficult appling for selective emitters. In this stud
Autor:
Gi-Chung Kwon, In Tae Kim, Eun Ha Choi, I-Hyun Cho, Myoung-Soo Yun, BuII Jeon, Junh-Young Rho, Guangsup Cho, Tae-Hoon Jo
Publikováno v:
Journal of The korean society for new and renewable energy. 9:23-29
Furnace and laser is currently the most important doping process. However furnace is typically difficult appling for selective emitters. Laser requires an expensive equipment and induces a structural damage due to high temperature using laser. This s
Autor:
In-Gyu Park, Hyoung-Dong Kang, Gi-Chung Kwon, Beop-Jong Jin, Myoung-Soo Yun, Deoc-Hwan Hyun, Joung-Sik Kim, Jong-Yong Choi
Publikováno v:
Journal of the Korean Vacuum Society. 19:314-318
We fabricated a plasma texturing for multi-crystalline silicon cells using reactive ion etching (RIE). Multi-crystalline Si cells have not benefited from the cost-effective wet-chemical texturing processes that reduce front surface reflectance on sin
Publikováno v:
2014 IEEE 41st International Conference on Plasma Sciences (ICOPS) held with 2014 IEEE International Conference on High-Power Particle Beams (BEAMS).
The solar cell manufacturing comprises the diffusion process to form a P-N junction on the silicon wafer. The impurities of III or V group are used in the diffusion process. Those are diffused thermally into the silicon wafer. The low efficiency is c
Autor:
Tae Hoon Jo, Park Jong-In, Hye Jin Park, Eun Ha Choi, Sang hun Kim, Guangsup Cho, Gi-Chung Kwon, Myoung Soo Yun
Publikováno v:
2014 IEEE 41st International Conference on Plasma Sciences (ICOPS) held with 2014 IEEE International Conference on High-Power Particle Beams (BEAMS).
Recently, the wavelength of the ultraviolet region examined laser light by a photochemical reaction, while dopant decomposition of impurities by dissolving the examined part by laser doping technique for applying the method is being developed. Howeve
Publikováno v:
Modern Physics Letters B. 30:1650310
In the current work, we have demonstrated the phase of ZnO by reference to block theory, in which the phase may be considered to show a paramagnetic ordering between block spins, which in turn comprise random spins that have a majority of individual
Doping of crystalline silicon solar cell by making use of atmospheric and sub-atmospheric plasma jet
Autor:
Han-Lim Kang, Junggil Kim, Je Huan Koo, Buil Jeon, Gi-Chung Kwon, Jung-Hyun Kim, Myoung-Soo Yun, Guangsup Cho
Publikováno v:
2012 Abstracts IEEE International Conference on Plasma Science.
Summary form only given. The doping process in the manufacturing of solar cell is to form a p-n junction by the injection of impurity materials into a silicon wafer. The elements of III or V group are used in the doping process during which the dopan
Autor:
Eun Ha Choi, In Tae Kim, Guangsup Cho, Gi-Chung Kwon, Buil Jeon, Tae-Hoon Jo, Donghae Kim, I-Hyun Cho, Myoung-Soo Yun
Publikováno v:
2012 Abstracts IEEE International Conference on Plasma Science.
Summary form only given. Generally, thermal doping method by furnace is used for solar-cell wafer doping. But it takes a lot of time and requires very expensive equipment.