Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Myoung-Ho Jung"'
Autor:
Myoung Ho Jung, Kwon, Gi Hyung
Publikováno v:
JOURNAL OF THE KOREAN SOCIETY DESIGN CULTURE. 24:555-564
Autor:
Yong-Seok Choi, Chang-Mo Kang, Duk-Jo Kong, Gon Namkoong, Myoung-Ho Jung, Jeong-Yong Lee, Dong-Seon Lee, Seung-Yong Nam, Seong-Ju Park, Young Ho Song
Publikováno v:
physica status solidi (a). 210:2214-2218
We report hybrid n-ZnO/i-InGaN/p-GaN solar cells in which the n-GaN layer of n-GaN/i-InGaN/p-GaN solar cell was replaced with n-type ZnO. In this study, inverted structures were used for hybrid ZnO/nitride solar cells where p-type GaN was first grown
Publikováno v:
Nanotechnology. 16:2227-2232
Atomic force microscopes (AFM) have been used to measure the strength of adhesion of photoresist patterns which generally collapse during rinsing with water in the development process. We suggest how to measure the collapsing force of the photoresist
Publikováno v:
Journal of Photopolymer Science and Technology. 16:463-466
In this study, we investigated the effect of surfactant-added rinse and soft bake on pattern collapse in ArF lithography. It was possible to obtain 21% narrower pattern with the aid of surfactant solution. Surfactant with low dynamic surface tension
Autor:
Seok-Hwan Oh, Joo-Tae Moon, Doo-Youl Lee, Joo-On Park, Sang-Gyun Woo, Han-Ku Cho, Insung Kim, Sung-Gon Jung, Myoung-Ho Jung
Publikováno v:
Optical Microlithography XVIII.
As k1 factor approaches the theoretical limit, optical proximity correction (OPC) treatments necessary to maintain dimensional tolerances involve increasingly complex correction shapes. This translates to more detailed, or larger mask pattern databas
Publikováno v:
SPIE Proceedings.
Introduction of ArF lithography has opened the era of sub-90nm patterning. Though the definable feature size was much reduced, poor etch durability and pattern collapse of ArF photoresist make it difficult to extend current patterning process into su
Publikováno v:
Advances in Resist Technology and Processing XX.
We investigated the effect of surfactant-added rinse and soft bake conditions on the pattern collapse in sub-100nm ArF lithography. Pattern collapse was estimated by comparing the critical dimension (CD) and the frequency at which collapse occurred.
Autor:
Myoung Ho Jung, Sang Hoon Lee, Kyu Hyung Ryu, Seoung Woo Han, Yung Geun Ahn, Byung Hee Oh, Shung-Chull Chae, Myoung Mook Lee, Jae Joong Kim, Hun Sik Park
Publikováno v:
Korean Circulation Journal. 33:533
Background and objectives:Congestive heart failure is one of the most frequent problems in cardiovascular patients. However, very little data concerning this syndrome in Korea was available. The objectives of this study were to evaluate the demograph
Autor:
Kyu Hyung Ryu, Seoung Woo Han, Shung Chull Chae, Ju Hwan Lee, Byung Hee Oh, Myoung Mook Lee, Sang Hoon Lee, Jae Joong Kim, Myoung Ho Jung, Yung Geun Ahn
Publikováno v:
Korean Circulation Journal. 33:629