Zobrazeno 1 - 10
of 12
pro vyhledávání: '"Mutsuo Kataoka"'
Publikováno v:
Journal of Photopolymer Science and Technology. 5:589-592
Publikováno v:
Photomask and X-Ray Mask Technology.
For the fabrication of 64 M and 256 MDRAM reticles, EB resists which have both high resolution and excellent dry etch resistance will be required. It is also particularly important to have high dry etch resistance for the manufacture of phase shift m
Autor:
Masaji Ohno, Mutsuo Kataoka
Publikováno v:
Bulletin of the Chemical Society of Japan. 46:3474-3477
A convenient method for the preparation of α-hydroxyimino cycloalkanones has been established by the reaction of cycloalkanones and nitrosyl chloride. ω-Cyanocarboxylic acids or their derivatives were obtained in good yield by the Beckmann rearrang
Publikováno v:
Bulletin of the Chemical Society of Japan. 44:1909-1914
Concerning the studies on the effect of ring strain on the electronic spectra of cylcic acetylenes, a series of polymethylene ether derivatives of p,p′-dihydroxydiphenyldiacetylene (VIn, n=13, 14, 15, and 18) has been prepared by the oxidative coup
Publikováno v:
Bulletin of the Chemical Society of Japan. 44:177-184
Publikováno v:
Bulletin of the Chemical Society of Japan. 44:1914-1916
Characteristic features of the electronic spectra of o,o′-bridged cyclic diphenyldiacetylenes (In), o,p′-bridged cyclic tolans (IIn), p,p′-bridged cyclic diphenyldiacetylenes (IIIn) and p,p′-bridged cyclic tolans (IVn) are compared. The hyper
Autor:
Mutsuo Kataoka, Masaji Ohno
Publikováno v:
Chemischer Informationsdienst. 5
Publikováno v:
Chemischer Informationsdienst. Organische Chemie. 2
Publikováno v:
Chemischer Informationsdienst. Organische Chemie. 2
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