Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Muta, Toshiyuki"'
Autor:
Atsuki Inoue, I. Sugiyama, Y. Yoshida, Ryouichi Yamashita, Hideo Yamashita, Muta Toshiyuki, Akihiko Konmoto, Hisashige Ando, S. Okada, Yoshihiko Satsukawa, Hiroyuki Sugiyama, Kuniki Morita, Takeo Asakawa, Tsuyoshi Motokurumada
Publikováno v:
IEEE Journal of Solid-State Circuits. 38:1896-1905
A fifth-generation SPARC64 processor is fabricated in 130-nm partially depleted silicon-on-insulator CMOS with eight layers of Cu metallization. At V/sub dd/ = 1.2 V and T/sub a/ = 25/spl deg/C, it runs at 1.3 GHz and dissipates 34.7 W. The chip cont
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::059a9eda8e28a7194a269a3aac594fc5
https://doi.org/10.1109/jssc.2003.818146
https://doi.org/10.1109/jssc.2003.818146
Autor:
Yuuji Yoshida, Seishi Okada, Akihiko Konmoto, Ryouichi Yamashita, Tsuyoshi Motokurumada, Hiroyuki Sugiyama, Hisashige Ando, Kuniki Morita, Aiichiro Inoue, Hideo Yamashita, Itsumi Sugiyama, Yoshihiko Satsukawa, Takeo Asakawa, Muta Toshiyuki
Publikováno v:
DAC
A 5th generation SPARC64 processor is fabricated in 130nm SOI CMOS process with 8 layers of Cu metallization. It runs at 1.3GHz with 34.7W power dissipation in the laboratory. The chip contains over 190M transistors with 19M in logic circuits. The ch
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::95f06aef48d01f4e3d397a853ef2e221
https://doi.org/10.1145/775832.776010
https://doi.org/10.1145/775832.776010
Autor:
Ando, Hisashige, Yoshida, Yuuji, Inoue, Aiichiro, Sugiyama, Itsumi, Asakawa, Takeo, Morita, Kuniki, Muta, Toshiyuki, Motokurumada, Tsuyoshi, Okada, Seishi, Yamashita, Hideo, Satsukawa, Yoshihiko, Konmoto, Akihiko, Yamashita, Ryouichi, Sugiyama, Hiroyuki
Publikováno v:
DAC: Annual ACM/IEEE Design Automation Conference; Jun2003, p702-705, 4p
Autor:
Ando, Hisashige, Yoshida, Yuuji, Inoue, Aiichiro, Sugiyama, Itsumi, Asakawa, Takeo, Morita, Kuniki, Muta, Toshiyuki, Motokurumada, Tsuyoshi, Okada, Seishi, Yamashita, Hideo, Satsukawa, Yoshihiko, Konmoto, Akihiko, Yamashita, Ryouichi, Sugiyama, Hiroyuki
Publikováno v:
IEEE Journal of Solid-State Circuits; Nov2003, Vol. 38 Issue 11, p1896-1905, 10p, 14 Black and White Photographs, 10 Diagrams, 2 Charts, 5 Graphs
Akademický článek
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Autor:
Hiroshige, Kinya, Soejima, Masasuke, Yuu, Kougi, Muta, Toshiyuki, Takasugi, Masayuki, Kuroiwa, Akio
Publikováno v:
Clinical & Experimental Nephrology; Mar1997, Vol. 1 Issue 1, p62-66, 5p
Publikováno v:
Journal of Japanese Society for Dialysis Therapy. 21:325-331
維持透析患者の血中アルミニウム (Al) 濃度を測定し, デスフェロキサミン (DFO) テストを行い, Al蓄積量の多いと考えられる症例に対してDFOを3カ月間投与した.対象: 維持透析患者75例, 平均
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::63a48f647f87f38574428c255e6f26cd
https://doi.org/10.4009/jsdt1985.21.325
https://doi.org/10.4009/jsdt1985.21.325
Publikováno v:
In European Journal of Pharmacology 1989 159(2):191-194