Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Mulckhuyse, W.F.W."'
Autor:
Koster, N.B., Sligte, E. te, Molkenboer, F.T., Deutz, A.F., Walle, P. van der, Muilwijk, P.M., Mulckhuyse, W.F.W., Oostdijck, B.W., Hollemans, C.L., Nijland, B.A.H., Kerkhof, P.J., Putten, M. van, Westerhout, J.
Publikováno v:
Panning, E.M.Goldberg, K.A., Extreme Ultraviolet (EUV) Lithography VIII Conference, 27 February-2 March 2017, San Jose, CA, USA, 10143
TNO is building EBL2 as a publicly accessible test facility for EUV lithography related development of photomasks, pellicles, optics, and other components requiring EUV exposure. EBL2 consists of a EUV Beam Line, a XPS system, and sample handling inf
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::ecfd5b255c7f75c451a8edf50da21002
http://resolver.tudelft.nl/uuid:ffe37bd7-5a65-4723-8683-f81030944577
http://resolver.tudelft.nl/uuid:ffe37bd7-5a65-4723-8683-f81030944577
Autor:
Sligte, E. te, Koster, N.B., Molkenboer, F.T., Walle, P. van der, Muilwijk, P.M., Mulckhuyse, W.F.W., Oostdijck, B.W., Hollemans, C.L., Nijland, B.A.H., Kerkhof, P.J., Putten, M. van, Hoogstrate A.M., Deutz, A.F.
Publikováno v:
Kasprowicz, B.S.Buck, P.D., Photomask Technology, 12 September 2016, San José CA, USA
TNO is building EBL2: a laboratory EUV exposure system capable of operating at high broad band EUV powers and intensities, in which XPS analysis of exposed samples is possible without breaking vacuum. Its goal is to accelerate the development and tes
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::da1e0104406fa1b655d355c2d7bd936f
http://resolver.tudelft.nl/uuid:27d9489f-a0bf-42ef-976c-3e0d38d534f5
http://resolver.tudelft.nl/uuid:27d9489f-a0bf-42ef-976c-3e0d38d534f5
Publikováno v:
Conference on Advances in Patterning Materials and Processes XXXII, 23-26 February 2015, San Jose, CA, USA, 9425
This paper presents a heuristic model for scanning helium ion beam lithography (SHIBL) in a EUV chemically amplified resist. The model employs a point-spread function to account for all physical and chemical phenomena involved in the resist activatio
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::3fb76e93da8573cacd76fd697551d6e8
http://resolver.tudelft.nl/uuid:45e12ad6-4e49-48ff-b162-db90099b7b2d
http://resolver.tudelft.nl/uuid:45e12ad6-4e49-48ff-b162-db90099b7b2d
Publikováno v:
SPIE Advanced Lithography Conference, Metrology, Inspection, and Process Control for Microlithography XXVIII, 23-27 February 2014, San Jose, CA, USA, 9050
The background in simple dark field particle inspection shows a high scatter variance which cannot be distinguished from signals by small particles. According to our models, illumination from different azimuths can reduce the background variance. A m
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::abd26ff9cfca003d18105d916867fbb0
http://resolver.tudelft.nl/uuid:63375aa4-7302-407a-80ae-c1364311d8be
http://resolver.tudelft.nl/uuid:63375aa4-7302-407a-80ae-c1364311d8be
Publikováno v:
9th International Conference on Condition Monitoring and Machinery Failure Prevention Technologies 2012, CM 2012 and MFPT 2012, 12-14 June 2012, London, UK, 490-501
In 3D reconstruction problems the number of design variables is large and the forward model is typically computationally expensive. Reconstruction using gradient-based optimization algorithms requires many gradient computations. For such problems the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::8a4b3e1c46f93c0b59e9a0fdcf3ce82f
http://resolver.tudelft.nl/uuid:d3d0e2ef-b599-4e75-98be-080ed6fa0175
http://resolver.tudelft.nl/uuid:d3d0e2ef-b599-4e75-98be-080ed6fa0175
Autor:
Lahaye, D., Mulckhuyse, W.F.W.
Publikováno v:
COMPEL-The International Journal for Computation and Mathematics in Electrical and Electronic Engineering, 3, 31, 895-903
Purpose - The purpose of this paper is to provide a framework for the implementation of an adjoint sensitivity formulation for least-squares partial differential equations constrained optimization problems exploiting a multiphysics finite elements pa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::bf1bfe0ef368b5d31bc8c3ed4556880d
http://resolver.tudelft.nl/uuid:3f6d245d-aff7-49a0-80f4-dc1c88fc4e39
http://resolver.tudelft.nl/uuid:3f6d245d-aff7-49a0-80f4-dc1c88fc4e39
Autor:
Ploeg, J., Mulckhuyse, W.F.W.
Publikováno v:
8th EAEC Congress, 18-20 June 2001, Bratislava, Slovakia
The modern society's increasing mobility is placing a growing demand on traffic safety. An important way to meet this demand will be offered by on-board driver assistance systems. Introducing inter-vehicle communication allows these systems to use tr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::f9efb5619031a6abb832f07905bb5514
http://resolver.tudelft.nl/uuid:727d23bb-0852-41d4-9902-74f787fd31ef
http://resolver.tudelft.nl/uuid:727d23bb-0852-41d4-9902-74f787fd31ef