Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Mujie Lan"'
Autor:
Dezhuang Yang, Dongfa Ding, Xingji Li, Shiyu He, Mujie Lan, Liyi Xiao, Chaoming Liu, Jianchun Liu
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment. 716:10-14
The degradation of optical power for superluminescent diodes is in situ measured under exposures of protons with various energies (170 keV, 3 MeV and 5 MeV), and 25 MeV carbon ions for several irradiation fluences. Experimental results show that the
Autor:
Chaoming Liu, Hongbin Geng, Jingdong Xiao, Xingji Li, Dezhuang Yang, Zhiming Zhao, He Shiyu, Mujie Lan
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment. 621:707-712
Electrical degradation of two type NPN bipolar junction transistors (BJTs) with different emitter sizes was examined under exposures of 70 and 110 keV electrons. Base and collector currents as a function of base–emitter voltage were in-situ measure
Radiation effects on silicon bipolar transistors caused by 3–10MeV protons and 20–60MeV bromine ions
Publikováno v:
Physica B: Condensed Matter. 405:1489-1494
The current gain degradation in silicon NPN bipolar junction transistors (BJTs) was examined under irradiation with 3–10 MeV protons and 20–60 MeV bromine (Br) ions with various dose levels. To characterize the radiation damage of the NPN BJTs, t
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment. 612:171-175
The radiation responses of the NPN bipolar junction transistors (BJTs) and the TTL bipolar integrated circuits (ICs) have been examined using 20, 40 and 60 MeV Br ions. Key electric parameter was measured and compared after each energy irradiation. E
Publikováno v:
SPIE Proceedings.
The configurations of electrochemical silicon etch-stop are discussed in this paper. An electrochemical etching machine with software and hardware, which can control the etching process of silicon very well, is designed and fabricated bas don the the
Publikováno v:
SPIE Proceedings.
Chalcogenide alloys Sb x Se y are being applied to phase-change, reversible optical storage. The non- stoichiometric compound are researched displaying their interesting phenomena before and after anneal in a furnace, which were characterized by the
Akademický článek
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.
Akademický článek
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.
Akademický článek
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.