Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Muilwijk, P.M."'
Autor:
Maas, D.J., Muilwijk, P.M., Putten, M. van, Graaf, F. de, Kievit, O., Boerboom, P.B.T.H., Koster, N.B.
Publikováno v:
Ukraintsev, V.A.Sanchez, M.I., 31st Conference on Metrology, Inspection, and Process Control for Microlithography, 29 February-2 March 2017
To produce high-end products, clean vacuum is often required. Even small amounts of high-mass molecules can reduce product yield. The challenge is to timely detect the presence of relevant contaminants. Here is where MFIG can help1. The massfiltered
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::16fac8e406655911798441f9395aac7f
http://resolver.tudelft.nl/uuid:3370cb73-6a71-450d-9a69-807345243b1e
http://resolver.tudelft.nl/uuid:3370cb73-6a71-450d-9a69-807345243b1e
Autor:
Maas, D.J., Muilwijk, P.M., Putten, M. van, Graaf, F. de, Kievit, O., Boerboom, P.B.T.H., Koster, N.B.
To produce high-end products, clean vacuum is often required. Even small amounts of high-mass molecules can reduce product yield. The challenge is to timely detect the presence of relevant contaminants. Here is where MFIG can help1. The massfiltered
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::9acff88f0cb0d37447223036d6cd690b
http://resolver.tudelft.nl/uuid:e9eab4d4-7a08-4fd5-a9ed-a01f9038907c
http://resolver.tudelft.nl/uuid:e9eab4d4-7a08-4fd5-a9ed-a01f9038907c
Autor:
Koster, N.B., Sligte, E. te, Molkenboer, F.T., Deutz, A.F., Walle, P. van der, Muilwijk, P.M., Mulckhuyse, W.F.W., Oostdijck, B.W., Hollemans, C.L., Nijland, B.A.H., Kerkhof, P.J., Putten, M. van, Westerhout, J.
Publikováno v:
Panning, E.M.Goldberg, K.A., Extreme Ultraviolet (EUV) Lithography VIII Conference, 27 February-2 March 2017, San Jose, CA, USA, 10143
TNO is building EBL2 as a publicly accessible test facility for EUV lithography related development of photomasks, pellicles, optics, and other components requiring EUV exposure. EBL2 consists of a EUV Beam Line, a XPS system, and sample handling inf
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::ecfd5b255c7f75c451a8edf50da21002
http://resolver.tudelft.nl/uuid:ffe37bd7-5a65-4723-8683-f81030944577
http://resolver.tudelft.nl/uuid:ffe37bd7-5a65-4723-8683-f81030944577
Autor:
Sligte, E. te, Koster, N.B., Molkenboer, F.T., Walle, P. van der, Muilwijk, P.M., Mulckhuyse, W.F.W., Oostdijck, B.W., Hollemans, C.L., Nijland, B.A.H., Kerkhof, P.J., Putten, M. van, Hoogstrate A.M., Deutz, A.F.
Publikováno v:
Kasprowicz, B.S.Buck, P.D., Photomask Technology, 12 September 2016, San José CA, USA
TNO is building EBL2: a laboratory EUV exposure system capable of operating at high broad band EUV powers and intensities, in which XPS analysis of exposed samples is possible without breaking vacuum. Its goal is to accelerate the development and tes
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::da1e0104406fa1b655d355c2d7bd936f
http://resolver.tudelft.nl/uuid:27d9489f-a0bf-42ef-976c-3e0d38d534f5
http://resolver.tudelft.nl/uuid:27d9489f-a0bf-42ef-976c-3e0d38d534f5
Autor:
Sefünç, Mustafa, Muilwijk, P.M., Eachambadi, R.T., Russo, R.F., van Wolferen, Hendricus A.G.M., Sengo, G., Bernhardi, Edward, Pollnau, Markus, García Blanco, Sonia Maria
Publikováno v:
17th Annual Symposium of the IEEE Photonics Benelux Chapter, 323-326
STARTPAGE=323;ENDPAGE=326;TITLE=17th Annual Symposium of the IEEE Photonics Benelux Chapter
STARTPAGE=323;ENDPAGE=326;TITLE=17th Annual Symposium of the IEEE Photonics Benelux Chapter
Potassium double tungstates doped with different rare-earth (RE) ions, have been shown as promising materials to provide high, broadband, stable gain at different wavelengths including ~1 μm (Yb3+), 1.55 μm (Er3+) and ~2 μm (Tm3+). In this paper,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=narcis______::ebe751738ac205a208078f866322eb03
https://research.utwente.nl/en/publications/photonic-integration-and-fabrication-technologies-for-onchip-active-nanodevices-in-double-tungstate-gain-materials(55da5ffc-ba95-46f0-83ba-48c0568c32ca).html
https://research.utwente.nl/en/publications/photonic-integration-and-fabrication-technologies-for-onchip-active-nanodevices-in-double-tungstate-gain-materials(55da5ffc-ba95-46f0-83ba-48c0568c32ca).html
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