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Publikováno v:
In Microelectronic Engineering 2009 86(2):140-144
Publikováno v:
STARTPAGE=555;ENDPAGE=557;TITLE=10th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors (SAFE)
Ultra pure water supplied inside the Fab is used in different tools at different stages of processing. Data of the particles measured in ultra pure water was compared with the defect density on wafers processed on these tools and a statistical relati
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=narcis______::f4a8841dbcb49a2ecbe2a9dd6f4909de
https://research.utwente.nl/en/publications/statistical-relation-between-particle-contaminations-in-ultra-pure-water-and-defects-generated-by-process-tools(78b55196-7398-41d8-bea7-84f37e02511e).html
https://research.utwente.nl/en/publications/statistical-relation-between-particle-contaminations-in-ultra-pure-water-and-defects-generated-by-process-tools(78b55196-7398-41d8-bea7-84f37e02511e).html