Zobrazeno 1 - 10
of 25
pro vyhledávání: '"Mu-Shih Yeh"'
Autor:
Siao-Cheng Yan, Chong-Jhe Sun, Meng-Ju Tsai, Lun-Chun Chen, Mu-Shih Yeh, Chien-Chang Li, Yao-Jen Lee, Yung-Chun Wu
Publikováno v:
IEEE Journal of the Electron Devices Society, Vol 8, Pp 589-593 (2020)
Germanium is a promising alternative material for use in advanced technology nodes because it exhibits symmetrical mobility of holes and electrons. Embedded nonvolatile memory (NVM) is essential in electronic devices with integrated circuit (IC) tech
Externí odkaz:
https://doaj.org/article/a389f55f76de47b99c14bd024bcaea31
Autor:
Lun-Chun Chen, Hung-Bin Chen, Yu-Shuo Chang, Shih-Han Lin, Ming-Hung Han, Jia-Jiun Wu, Mu-Shih Yeh, Yu-Ru Lin, Yung-Chun Wu
Publikováno v:
IEEE Journal of the Electron Devices Society, Vol 7, Pp 168-173 (2019)
A low-voltage programmable gate-all-around (GAA) nanosheet poly-Si thin-film transistor (TFT) nonvolatile memory (NVM), which uses band-to-band tunneling induced hot electron (BBHE) programming, is demonstrated. The BBHE method is extremely efficient
Externí odkaz:
https://doaj.org/article/3a16f88ca06c45609218901b2951549b
Autor:
Yu-Ru Lin, Yi-Yun Yang, Yu-Husien Lin, Erry Dwi Kurniawan, Mu-Shih Yeh, Lun-Chun Chen, Yug-Chun Wu
Publikováno v:
IEEE Journal of the Electron Devices Society, Vol 6, Pp 1187-1191 (2018)
This comprehensive study of the horizontally p-type stacked nanosheets inversion mode thinfilm transistor with gate-all-around (SNS-GAATFT) and multi-gate (SNS-TFT) structures. The stacked nanosheets device structure, fabrication, and electrical char
Externí odkaz:
https://doaj.org/article/71a2d47776ec47248171195c9720135f
Publikováno v:
IEEE Journal of the Electron Devices Society, Vol 4, Iss 2, Pp 50-54 (2016)
The short-channel effect (SCE) is an important issue in CMOS technology. In this paper, a junctionless (JL) poly-Si nanowire FET (NW-FET) with gated raised source/drain (S/D) was demonstrated to suppress the SCE. The gated raised S/D structure enhanc
Externí odkaz:
https://doaj.org/article/43ca6c1f17e44f30ad27ac6552c44340
Autor:
Lun-Chun Chen, Mu-Shih Yeh, Yu-Ru Lin, Ko-Wei Lin, Min-Hsin Wu, Vasanthan Thirunavukkarasu, Yung-Chun Wu
Publikováno v:
AIP Advances, Vol 7, Iss 2, Pp 025301-025301-5 (2017)
We propose the concept of the electrical junction in a junctionless (JL) field-effect-transistor (FET) to illustrate the transfer characteristics of the JL FET. In this work, nanowire (NW) junctionless poly-Si thin-film transistors are used to demons
Externí odkaz:
https://doaj.org/article/30813557d253485998b08c763eca8106
Autor:
Mu-Shih Yeh, 葉沐詩
98
The solar energy is a natural energy easily obtained, it is one of the most convenient, regardless of region of energy, and there is no pollution produced, it has not been widely used, due to high costs, low efficiency, and convenience issues
The solar energy is a natural energy easily obtained, it is one of the most convenient, regardless of region of energy, and there is no pollution produced, it has not been widely used, due to high costs, low efficiency, and convenience issues
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/74770576274045531480
Autor:
Yao-Jen Lee, Mu-Shih Yeh, Chien-Chang Li, Lun-Chun Chen, Yung-Chun Wu, Siao-Cheng Yan, Meng-Ju Tsai, Chong-Jhe Sun
Publikováno v:
IEEE Journal of the Electron Devices Society, Vol 8, Pp 589-593 (2020)
Germanium is a promising alternative material for use in advanced technology nodes because it exhibits symmetrical mobility of holes and electrons. Embedded nonvolatile memory (NVM) is essential in electronic devices with integrated circuit (IC) tech
Autor:
Jia-Jiun Wu, Ming-Hung Han, Shih-Han Lin, Hung-Bin Chen, Mu-Shih Yeh, Yung-Chun Wu, Lun-Chun Chen, Yu-Shuo Chang, Yu-Ru Lin
Publikováno v:
IEEE Journal of the Electron Devices Society, Vol 7, Pp 168-173 (2019)
A low-voltage programmable gate-all-around (GAA) nanosheet poly-Si thin-film transistor (TFT) nonvolatile memory (NVM), which uses band-to-band tunneling induced hot electron (BBHE) programming, is demonstrated. The BBHE method is extremely efficient
Publikováno v:
2019 Silicon Nanoelectronics Workshop (SNW).
A twin FinFET structure non-volatile memory with high mobility germanium channel (Twin Ge FinFET structure NVM) is demonstrated. An extrapolation of the memory window can achieve 10V of V TH at 21V for 10−3s which is large enough for NVM applicatio
Publikováno v:
IEEE Journal of the Electron Devices Society, Vol 4, Iss 2, Pp 50-54 (2016)
The short-channel effect (SCE) is an important issue in CMOS technology. In this paper, a junctionless (JL) poly-Si nanowire FET (NW-FET) with gated raised source/drain (S/D) was demonstrated to suppress the SCE. The gated raised S/D structure enhanc