Effects of carbon contamination on the printing performance of extreme ultraviolet masks

Autor: Fan, Y.-J., Yankulin, L., Antohe, A., Thomas, P., Mbanaso, C., Garg, R., Wang, Y., Wuest, A., Goodwin, F., Huh, S., Naulleau, P., Goldberg, K., Movhi, I., Denbeau, G.

Publikováno v: Fan, Y.-J.; Yankulin, L.; Antohe, A.; Thomas, P.; Mbanaso, C.; Garg, R.; et al.(2010). Effects of carbon contamination on the printing performance of extreme ultraviolet masks. JVST B. Lawrence Berkeley National Laboratory: Lawrence Berkeley National Laboratory. Retrieved from: http://www.escholarship.org/uc/item/5m00m4z3

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=od_______325::c6a5fd9eb036f99ca8df873125a5fd57
http://www.escholarship.org/uc/item/5m00m4z3